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Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication

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Main Authors: Balakrishnan, Sharma Rao, Muhammad Nurfaiz, Asri, Uda, Hashim, Prof. Dr., Tijjani Adam, Shuwa
Other Authors: bala.sharmarao@gmail.com
Format: Article
Language:English
Published: Trans Tech Publications 2014
Subjects:
Biosensor
Clinical diagnostics
Critical dimension
Photolithography
Photoresist
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33562
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spelling my.unimap-335622014-04-09T07:13:26Z Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication Balakrishnan, Sharma Rao Muhammad Nurfaiz, Asri Uda, Hashim, Prof. Dr. Tijjani Adam, Shuwa bala.sharmarao@gmail.com uda@unimap.edu.my tijjaniadam@yahoo.com Biosensor Clinical diagnostics Critical dimension Photolithography Photoresist Link to publisher's homepage at http://www.ttp.net/ For a submicron photolithography process, there is little room for error. In this paper, an optimized technique for photoresist (PR) development is reported, to fabricate a nanogap biosensor for application in biomedical nanodiagnostics. The pattern transfer on the wafer substrate requires precise alignment and Deep Ultra-Violet (DUV) light exposure. This research describes the photolithography process to develop a standard manufacturing procedure for pattern transfer from chrome mask. The key factor for PR development is understood and the optimization is done based on the PR thickness, spin speed, spin time, exposure time, post-exposure bake (PEB) time, developer concentration and developing time to achieve the design feature size of 1 micron. The PR is coated and spun at 3000 rpm and 5000 rpm at 30s and 40s respectively to form a very thin layer. However, the UV exposure time is remained constant at 10s. After the pattern transfer, the wafer is immersed in different concentrations of RD6 developer to develop the PR. To further improve the resolution of image transfer, the PEB time is also optimized for a better throughput on feature size. These optimizations are important to reduce the dimension error and were able to achieve error free design to protect critical dimension and prevent device failure. 2014-04-09T07:13:26Z 2014-04-09T07:13:26Z 2014 Article Advanced Materials Research, vol.832, 2014, pages 89-94 1662-8985 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33562 http://www.scientific.net/AMR.832.89 10.4028/www.scientific.net/AMR.832.89 en Trans Tech Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Biosensor
Clinical diagnostics
Critical dimension
Photolithography
Photoresist
spellingShingle Biosensor
Clinical diagnostics
Critical dimension
Photolithography
Photoresist
Balakrishnan, Sharma Rao
Muhammad Nurfaiz, Asri
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
description Link to publisher's homepage at http://www.ttp.net/
author2 bala.sharmarao@gmail.com
author_facet bala.sharmarao@gmail.com
Balakrishnan, Sharma Rao
Muhammad Nurfaiz, Asri
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
format Article
author Balakrishnan, Sharma Rao
Muhammad Nurfaiz, Asri
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
author_sort Balakrishnan, Sharma Rao
title Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
title_short Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
title_full Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
title_fullStr Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
title_full_unstemmed Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
title_sort conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
publisher Trans Tech Publications
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/33562
_version_ 1643797212519464960
score 13.211869

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