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Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

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Bibliographic Details
Main Author: Khoo Chien Chin
Other Authors: Uda Hashim, P.M. Dr. (Advisor)
Format: Learning Object
Language:English
Published: Universiti Malaysia Perlis 2008
Subjects:
Lithography, Electron beam
Lithography
Polymethyl-methacrylate (PMMA
Lithography > Technique
Integrated circuits
Nanotechnology
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
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spelling my.unimap-23902008-10-29T05:08:46Z Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert Khoo Chien Chin Uda Hashim, P.M. Dr. (Advisor) Lithography, Electron beam Lithography Polymethyl-methacrylate (PMMA Lithography -- Technique Integrated circuits Nanotechnology Access is limited to UniMAP community. This paper discusses the application of a design of experiments (DOE) experimental method for analyzing the influence of four parameters (coating time, spinning speed, and softbake time and softbake temperature).involved in e-beam lithography process. Initially, the experimental methods applied to the lithography process are described. Main focus of this project is to optimize and to characterize the thickness of polymethyl-methacrylate (PMMA) with molecular weights of 950K. The thicknesses of PMMA resists are characterized and optimized to obtain ideal process settings for the best lithography performance. Parameters of lithography can be studied to determine the most significant factor that contributes to optimum performance. Results were evaluated by means of variance analysis (ANOVA) which assessed how the variation in the four different controllable parameters influenced PMMA thickness in lithography. Spinning speed is the main contributing factor to 950K PMMA thickness while coating time, softbake time and softbake temperature were found not important. 2008-10-13T06:31:45Z 2008-10-13T06:31:45Z 2008-05 Learning Object http://hdl.handle.net/123456789/2390 en Universiti Malaysia Perlis School of Manufacturing Engineering
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Lithography, Electron beam
Lithography
Polymethyl-methacrylate (PMMA
Lithography -- Technique
Integrated circuits
Nanotechnology
spellingShingle Lithography, Electron beam
Lithography
Polymethyl-methacrylate (PMMA
Lithography -- Technique
Integrated circuits
Nanotechnology
Khoo Chien Chin
Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
description Access is limited to UniMAP community.
author2 Uda Hashim, P.M. Dr. (Advisor)
author_facet Uda Hashim, P.M. Dr. (Advisor)
Khoo Chien Chin
format Learning Object
author Khoo Chien Chin
author_sort Khoo Chien Chin
title Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
title_short Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
title_full Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
title_fullStr Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
title_full_unstemmed Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
title_sort optimization of 950k pmma resists for nano-application using statistical design expert
publisher Universiti Malaysia Perlis
publishDate 2008
url http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
_version_ 1643787599521775616
score 13.222552

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