The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto a substrate. In this project, EBID method has been used to deposit the square shape carbon structure on the substrate using the resid...
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Universiti Malaysia Perlis
2008
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my.unimap-19612008-09-05T07:13:55Z The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method Muhammad Afiq Abdul Aziz Shaiful Nizam Mohyar (Advisor) Microelectronics Electron beams Semiconductors Electrons -- Beams Electron microscopy Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto a substrate. In this project, EBID method has been used to deposit the square shape carbon structure on the substrate using the residual gas hydrocarbon as the precursor gas during deposition. With 90000X magnification, the deposition was performed by focusing the high energy electron beam with acceleration voltages of 5 kV~25 kV in a fixed 15 minutes of deposition time directly to the substrate. Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) were used to characterize the growth of the deposited structure in term of thickness, volume and surface roughness influenced by the electron beam acceleration voltages. The growth of the deposited structure was analyzed to increase with higher acceleration voltages. The use of the deposited structure also has been study for further research in EBID applications. 2008-09-05T07:13:55Z 2008-09-05T07:13:55Z 2008-04 Learning Object http://hdl.handle.net/123456789/1961 en Universiti Malaysia Perlis School of Microelectronic Engineering |
| institution |
Universiti Malaysia Perlis |
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UniMAP Library |
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Institutional Repository |
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Asia |
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Malaysia |
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Universiti Malaysia Perlis |
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UniMAP Library Digital Repository |
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http://dspace.unimap.edu.my/ |
| language |
English |
| topic |
Microelectronics Electron beams Semiconductors Electrons -- Beams Electron microscopy |
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Microelectronics Electron beams Semiconductors Electrons -- Beams Electron microscopy Muhammad Afiq Abdul Aziz The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| description |
Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto
a substrate. In this project, EBID method has been used to deposit the square shape
carbon structure on the substrate using the residual gas hydrocarbon as the precursor gas
during deposition. With 90000X magnification, the deposition was performed by focusing the high energy electron beam with acceleration voltages of 5 kV~25 kV in a
fixed 15 minutes of deposition time directly to the substrate. Scanning Electron
Microscopy (SEM) and Atomic Force Microscopy (AFM) were used to characterize the growth of the deposited structure in term of thickness, volume and surface roughness
influenced by the electron beam acceleration voltages. The growth of the deposited
structure was analyzed to increase with higher acceleration voltages. The use of the
deposited structure also has been study for further research in EBID applications. |
| author2 |
Shaiful Nizam Mohyar (Advisor) |
| author_facet |
Shaiful Nizam Mohyar (Advisor) Muhammad Afiq Abdul Aziz |
| format |
Learning Object |
| author |
Muhammad Afiq Abdul Aziz |
| author_sort |
Muhammad Afiq Abdul Aziz |
| title |
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| title_short |
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| title_full |
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| title_fullStr |
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| title_full_unstemmed |
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method |
| title_sort |
influence of the accelerating voltages on the growth of the square structure during electron beam induced deposition (ebid) method |
| publisher |
Universiti Malaysia Perlis |
| publishDate |
2008 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/1961 |
| _version_ |
1643787505786421248 |
| score |
13.251813 |