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The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method

Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto a substrate. In this project, EBID method has been used to deposit the square shape carbon structure on the substrate using the resid...

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主要作者: Muhammad Afiq Abdul Aziz
其他作者: Shaiful Nizam Mohyar (Advisor)
格式: Learning Object
語言:English
出版: Universiti Malaysia Perlis 2008
主題:
Microelectronics
Electron beams
Semiconductors
Electrons > Beams
Electron microscopy
在線閱讀:http://dspace.unimap.edu.my/xmlui/handle/123456789/1961
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spelling my.unimap-19612008-09-05T07:13:55Z The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method Muhammad Afiq Abdul Aziz Shaiful Nizam Mohyar (Advisor) Microelectronics Electron beams Semiconductors Electrons -- Beams Electron microscopy Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto a substrate. In this project, EBID method has been used to deposit the square shape carbon structure on the substrate using the residual gas hydrocarbon as the precursor gas during deposition. With 90000X magnification, the deposition was performed by focusing the high energy electron beam with acceleration voltages of 5 kV~25 kV in a fixed 15 minutes of deposition time directly to the substrate. Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) were used to characterize the growth of the deposited structure in term of thickness, volume and surface roughness influenced by the electron beam acceleration voltages. The growth of the deposited structure was analyzed to increase with higher acceleration voltages. The use of the deposited structure also has been study for further research in EBID applications. 2008-09-05T07:13:55Z 2008-09-05T07:13:55Z 2008-04 Learning Object http://hdl.handle.net/123456789/1961 en Universiti Malaysia Perlis School of Microelectronic Engineering
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Microelectronics
Electron beams
Semiconductors
Electrons -- Beams
Electron microscopy
spellingShingle Microelectronics
Electron beams
Semiconductors
Electrons -- Beams
Electron microscopy
Muhammad Afiq Abdul Aziz
The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
description Electron beam induced deposition (EBID) is a method for high-resolution direct material deposition from the gas phase in the Scanning Electron Microscopy (SEM) onto a substrate. In this project, EBID method has been used to deposit the square shape carbon structure on the substrate using the residual gas hydrocarbon as the precursor gas during deposition. With 90000X magnification, the deposition was performed by focusing the high energy electron beam with acceleration voltages of 5 kV~25 kV in a fixed 15 minutes of deposition time directly to the substrate. Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) were used to characterize the growth of the deposited structure in term of thickness, volume and surface roughness influenced by the electron beam acceleration voltages. The growth of the deposited structure was analyzed to increase with higher acceleration voltages. The use of the deposited structure also has been study for further research in EBID applications.
author2 Shaiful Nizam Mohyar (Advisor)
author_facet Shaiful Nizam Mohyar (Advisor)
Muhammad Afiq Abdul Aziz
format Learning Object
author Muhammad Afiq Abdul Aziz
author_sort Muhammad Afiq Abdul Aziz
title The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
title_short The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
title_full The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
title_fullStr The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
title_full_unstemmed The influence of the accelerating voltages on the growth of the square structure during Electron Beam Induced Deposition (EBID) method
title_sort influence of the accelerating voltages on the growth of the square structure during electron beam induced deposition (ebid) method
publisher Universiti Malaysia Perlis
publishDate 2008
url http://dspace.unimap.edu.my/xmlui/handle/123456789/1961
_version_ 1643787505786421248
score 13.250246

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