Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability
RIE etched wet silica-on-silicon analysis is more to surface roughness analysis which analysis on silica substrate after plasma etching especially on de-ionized water droplets testing for fluid wettability scope. The thick oxide is needed for RIE purpose and characterized the etching and surface pr...
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Universiti Malaysia Perlis
2008
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my.unimap-13332008-10-29T04:52:01Z Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability Noor Aini Hamimah Abd. Rahim Prabakaran Poopalan, Assoc. Prof. Dr. (Advisor) Silica Reactive Ion Etching (RIE) Silica-on-silicon analysis Surface roughness analysis Atomic Force Microscope Wet-Silica-On-Silicon Analysis RIE etched wet silica-on-silicon analysis is more to surface roughness analysis which analysis on silica substrate after plasma etching especially on de-ionized water droplets testing for fluid wettability scope. The thick oxide is needed for RIE purpose and characterized the etching and surface profile using Atomic Force Microscope. The contact angles measurement is required for the wettability analysis thus to characterized the de-ionized water droplets profile using optical inspection. This contact angles must be more than 90° for non-wetting profile or less than 90° for wetting profile. All the entire measurements angles allowed gives the silica substrate surface analysis results that related to RIE etched wet silica-on-silicon analysis. In this project, all the contact angles are wetting profile which is homogeneous types. 2008-06-27T08:31:43Z 2008-06-27T08:31:43Z 2007-03 Learning Object http://hdl.handle.net/123456789/1333 en Universiti Malaysia Perlis School of Microelectronic Engineering |
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Silica Reactive Ion Etching (RIE) Silica-on-silicon analysis Surface roughness analysis Atomic Force Microscope Wet-Silica-On-Silicon Analysis |
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Silica Reactive Ion Etching (RIE) Silica-on-silicon analysis Surface roughness analysis Atomic Force Microscope Wet-Silica-On-Silicon Analysis Noor Aini Hamimah Abd. Rahim Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
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RIE etched wet silica-on-silicon analysis is more to surface roughness analysis which
analysis on silica substrate after plasma etching especially on de-ionized water droplets testing for fluid wettability scope. The thick oxide is needed for RIE purpose and characterized the etching and surface profile using Atomic Force Microscope. The contact angles measurement is required for the wettability analysis thus to characterized the de-ionized water droplets profile using optical inspection. This contact angles must be more than 90° for non-wetting profile or less than 90° for wetting profile. All the entire measurements angles allowed gives the silica substrate surface analysis results that related to RIE etched wet silica-on-silicon analysis. In this project, all the contact angles
are wetting profile which is homogeneous types. |
author2 |
Prabakaran Poopalan, Assoc. Prof. Dr. (Advisor) |
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Prabakaran Poopalan, Assoc. Prof. Dr. (Advisor) Noor Aini Hamimah Abd. Rahim |
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Learning Object |
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Noor Aini Hamimah Abd. Rahim |
author_sort |
Noor Aini Hamimah Abd. Rahim |
title |
Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
title_short |
Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
title_full |
Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
title_fullStr |
Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
title_full_unstemmed |
Reactive Ion Etching (RIE) Etched Wet-Silica-On-Silicon Analysis for Fluid Wettability |
title_sort |
reactive ion etching (rie) etched wet-silica-on-silicon analysis for fluid wettability |
publisher |
Universiti Malaysia Perlis |
publishDate |
2008 |
url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/1333 |
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1643787225963429888 |
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13.211869 |