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Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography

Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...

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Main Authors: Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format: Conference or Workshop Item
Language:English
Published: 2015
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf
http://umpir.ump.edu.my/id/eprint/10471/
http://dx.doi.org/10.1109/ICEP-IAAC.2015.7111048
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spelling my.ump.umpir.104712018-06-28T01:09:33Z http://umpir.ump.edu.my/id/eprint/10471/ Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography Nurhafizah, Abu Talip Hayashi, Tatsuya Taniguchi, Jun Hiwasa, Shin TK Electrical engineering. Electronics Nuclear engineering Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the release agent and shortens the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, prolong the lifetime of the release agent on ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the release agent on the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to 75th imprint compared to complete-filling UV-NIL up to the 40th imprint. 2015 Conference or Workshop Item PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf Nurhafizah, Abu Talip and Hayashi, Tatsuya and Taniguchi, Jun and Hiwasa, Shin (2015) Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography. In: ICEP-IAAC 2015 Proceedings : International Conference on Electronics Packaging and iMAPS All Asia Conference, 14-17 April 2015 , Kyoto, Japan. pp. 418-421.. http://dx.doi.org/10.1109/ICEP-IAAC.2015.7111048
institution Universiti Malaysia Pahang
building UMP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Pahang
content_source UMP Institutional Repository
url_provider http://umpir.ump.edu.my/
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
description Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the release agent and shortens the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, prolong the lifetime of the release agent on ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the release agent on the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to 75th imprint compared to complete-filling UV-NIL up to the 40th imprint.
format Conference or Workshop Item
author Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_facet Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_sort Nurhafizah, Abu Talip
title Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
title_short Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
title_full Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
title_fullStr Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
title_full_unstemmed Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
title_sort lifetime prolongation of release agent on antireflection structure molds by means of partialfilling ultraviolet nanoimprint lithography
publishDate 2015
url http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf
http://umpir.ump.edu.my/id/eprint/10471/
http://dx.doi.org/10.1109/ICEP-IAAC.2015.7111048
_version_ 1643666400296828928
score 13.211869

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