Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UVNIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier Ltd
2015
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/8811/1/fkee-2015-Nurhafizah-Lifetime%20Amelioration-abs.pdf http://umpir.ump.edu.my/id/eprint/8811/ http://dx.doi.org/10.1016/j.mee.2015.01.035 |
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