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Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films

TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The struc...

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Main Authors:	Hasan, M.M., Haseeb, A.S. Md. Abdul, Saidur, Rahman, Masjuki, Haji Hassan, Abd Shukor, Mohd Hamdi
Format:	Article
Published:	Elsevier 2010
Subjects:	TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery
Online Access:	http://eprints.um.edu.my/6766/ https://doi.org/10.1016/j.optmat.2009.07.011
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spelling	my.um.eprints.67662021-10-01T03:56:30Z http://eprints.um.edu.my/6766/ Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Abd Shukor, Mohd Hamdi TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The structural and optical properties of the thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and ultraviolet–visible–near infrared (UV–VIS–NIR) spectrophotometry. XRD results show that as-grown and post-annealed TiO2 films have anatase crystal structure. Higher substrate and annealing temperatures result in a slight increase of crystallinity. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and the transmittance decreases slightly with an increase in annealing temperature. The refractive indices (at λ = 550 nm) of the as-deposited and annealed films are found to be in the range of 2.31–2.37 and 2.31–2.35, respectively. Extinction coefficient decreases slightly with increasing substrate and annealing temperatures. The indirect and direct optical band gap of the as-grown films increases from 3.39 to 3.42 eV and 3.68 to 3.70 eV, respectively, with the increase of substrate temperatures. Annealed TiO2 films also exhibit an increase in the values of indirect and direct optical band gap. Elsevier 2010 Article PeerReviewed Hasan, M.M. and Haseeb, A.S. Md. Abdul and Saidur, Rahman and Masjuki, Haji Hassan and Abd Shukor, Mohd Hamdi (2010) Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films. Optical Materials, 32 (6). pp. 690-695. ISSN 0925-3467 https://doi.org/10.1016/j.optmat.2009.07.011 doi:10.1016/j.optmat.2009.07.011
institution	Universiti Malaya
building	UM Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Malaya
content_source	UM Research Repository
url_provider	http://eprints.um.edu.my/
topic	TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery
spellingShingle	TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Abd Shukor, Mohd Hamdi Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
description	TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The structural and optical properties of the thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and ultraviolet–visible–near infrared (UV–VIS–NIR) spectrophotometry. XRD results show that as-grown and post-annealed TiO2 films have anatase crystal structure. Higher substrate and annealing temperatures result in a slight increase of crystallinity. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and the transmittance decreases slightly with an increase in annealing temperature. The refractive indices (at λ = 550 nm) of the as-deposited and annealed films are found to be in the range of 2.31–2.37 and 2.31–2.35, respectively. Extinction coefficient decreases slightly with increasing substrate and annealing temperatures. The indirect and direct optical band gap of the as-grown films increases from 3.39 to 3.42 eV and 3.68 to 3.70 eV, respectively, with the increase of substrate temperatures. Annealed TiO2 films also exhibit an increase in the values of indirect and direct optical band gap.
format	Article
author	Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Abd Shukor, Mohd Hamdi
author_facet	Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Abd Shukor, Mohd Hamdi
author_sort	Hasan, M.M.
title	Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
title_short	Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
title_full	Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
title_fullStr	Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
title_full_unstemmed	Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
title_sort	influence of substrate and annealing temperatures on optical properties of rf-sputtered tio2 thin films
publisher	Elsevier
publishDate	2010
url	http://eprints.um.edu.my/6766/ https://doi.org/10.1016/j.optmat.2009.07.011
_version_	1713200128513277952
score	13.211869

Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films

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