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Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films

Purpose: This paper aims to determine the crystallite size and microstrain values of AgSiN thin films using potential approach called approximation method. This method can be used as a replacement for other determination methods such as Williamson-Hall (W-H) plot and Warren-Averbach analysis. Design...

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Main Authors:	Mohamad Zaidi, Umi Zalilah, Bushroa, Abdul Razak, Ghahnavyeh, Reza Rahbari, Mahmoodian, Reza
Format:	Article
Published:	Emerald 2019
Subjects:	TJ Mechanical engineering and machinery
Online Access:	http://eprints.um.edu.my/24010/ https://doi.org/10.1108/PRT-03-2018-0026
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spelling	my.um.eprints.240102020-03-12T01:06:10Z http://eprints.um.edu.my/24010/ Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films Mohamad Zaidi, Umi Zalilah Bushroa, Abdul Razak Ghahnavyeh, Reza Rahbari Mahmoodian, Reza TJ Mechanical engineering and machinery Purpose: This paper aims to determine the crystallite size and microstrain values of AgSiN thin films using potential approach called approximation method. This method can be used as a replacement for other determination methods such as Williamson-Hall (W-H) plot and Warren-Averbach analysis. Design/methodology/approach: The monolayer AgSiN thin films on Ti6Al4V alloy were fabricated using magnetron sputtering technique. To evaluate the crystallite size and microstrain values, the thin films were deposited under different bias voltage (−75, −150 and −200 V). X-ray diffraction (XRD) broadening profile along with approximation method were used to determine the crystallite size and microstrain values. The reliability of the method was proved by comparing it with scanning electron microscopy graph and W-H plot method. The second parameters’ microstrain obtained was used to project the residual stress present in the thin films. Further discussion on the thin films was done by relating the residual stress with the adhesion strength and the thickness of the films. Findings: XRD-approximation method results revealed that the crystallite size values obtained from the method were in a good agreement when it is compared with Scherer formula and W-H method. Meanwhile, the calculations for thin films corresponding residual stresses were correlated well with scratch adhesion critical loads with the lowest residual stress was noted for sample with lowest microstrain and has thickest thickness among the three samples. Practical implications: The fabricated thin films were intended to be used in antibacterial applications. Originality/value: Up to the knowledge from literature review, there are no reports on depositing AgSiN on Ti6Al4V alloy via magnetron sputtering to elucidate the crystallite size and microstrain properties using the approximation method. © 2018, Emerald Publishing Limited. Emerald 2019 Article PeerReviewed Mohamad Zaidi, Umi Zalilah and Bushroa, Abdul Razak and Ghahnavyeh, Reza Rahbari and Mahmoodian, Reza (2019) Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films. Pigment & Resin Technology, 48 (6). pp. 473-480. ISSN 0369-9420 https://doi.org/10.1108/PRT-03-2018-0026 doi:10.1108/PRT-03-2018-0026
institution	Universiti Malaya
building	UM Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Malaya
content_source	UM Research Repository
url_provider	http://eprints.um.edu.my/
topic	TJ Mechanical engineering and machinery
spellingShingle	TJ Mechanical engineering and machinery Mohamad Zaidi, Umi Zalilah Bushroa, Abdul Razak Ghahnavyeh, Reza Rahbari Mahmoodian, Reza Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
description	Purpose: This paper aims to determine the crystallite size and microstrain values of AgSiN thin films using potential approach called approximation method. This method can be used as a replacement for other determination methods such as Williamson-Hall (W-H) plot and Warren-Averbach analysis. Design/methodology/approach: The monolayer AgSiN thin films on Ti6Al4V alloy were fabricated using magnetron sputtering technique. To evaluate the crystallite size and microstrain values, the thin films were deposited under different bias voltage (−75, −150 and −200 V). X-ray diffraction (XRD) broadening profile along with approximation method were used to determine the crystallite size and microstrain values. The reliability of the method was proved by comparing it with scanning electron microscopy graph and W-H plot method. The second parameters’ microstrain obtained was used to project the residual stress present in the thin films. Further discussion on the thin films was done by relating the residual stress with the adhesion strength and the thickness of the films. Findings: XRD-approximation method results revealed that the crystallite size values obtained from the method were in a good agreement when it is compared with Scherer formula and W-H method. Meanwhile, the calculations for thin films corresponding residual stresses were correlated well with scratch adhesion critical loads with the lowest residual stress was noted for sample with lowest microstrain and has thickest thickness among the three samples. Practical implications: The fabricated thin films were intended to be used in antibacterial applications. Originality/value: Up to the knowledge from literature review, there are no reports on depositing AgSiN on Ti6Al4V alloy via magnetron sputtering to elucidate the crystallite size and microstrain properties using the approximation method. © 2018, Emerald Publishing Limited.
format	Article
author	Mohamad Zaidi, Umi Zalilah Bushroa, Abdul Razak Ghahnavyeh, Reza Rahbari Mahmoodian, Reza
author_facet	Mohamad Zaidi, Umi Zalilah Bushroa, Abdul Razak Ghahnavyeh, Reza Rahbari Mahmoodian, Reza
author_sort	Mohamad Zaidi, Umi Zalilah
title	Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
title_short	Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
title_full	Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
title_fullStr	Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
title_full_unstemmed	Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films
title_sort	crystallite size and microstrain: xrd line broadening analysis of agsin thin films
publisher	Emerald
publishDate	2019
url	http://eprints.um.edu.my/24010/ https://doi.org/10.1108/PRT-03-2018-0026
_version_	1662755210551885824
score	13.211869

Crystallite size and microstrain: XRD line broadening analysis of AgSiN thin films

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