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Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas

Formation of ZrO2 by simultaneous thermal oxidation and nitridation in nitrous oxide of sputtered Zr on Si substrate is reported here for the first time. Sputtered Zr on Si substrate and followed by oxidation and nitridation in nitrous oxide ambient at 700 °C for various durations (5–20 min) have be...

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Main Authors: Wong, Y.H., Cheong, K.Y.
Format: Article
Published: Elsevier 2011
Subjects:
TA Engineering (General). Civil engineering (General)
Online Access:http://eprints.um.edu.my/12998/
http://www.sciencedirect.com/science/article/pii/S0925838811013235
http://dx.doi.org/10.1016/j.jallcom.2011.06.041
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spelling my.um.eprints.129982015-03-11T02:23:25Z http://eprints.um.edu.my/12998/ Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas Wong, Y.H. Cheong, K.Y. TA Engineering (General). Civil engineering (General) Formation of ZrO2 by simultaneous thermal oxidation and nitridation in nitrous oxide of sputtered Zr on Si substrate is reported here for the first time. Sputtered Zr on Si substrate and followed by oxidation and nitridation in nitrous oxide ambient at 700 °C for various durations (5–20 min) have been systematically investigated. The structural and chemical properties of the samples were examined. Chemical depth profiles of the samples have been evaluated by X-ray photoelectron spectroscopy. Stoichiometric Zr–O (ZrO2) and its interfacial layer consisted of mixed sub-stoichiometric Zr–O, Zr–N, Zr–Si–O, Si–N, and/or Si–O–N phases were identified. A possible model related to the oxidation and nitridation mechanisms has been proposed and explained. Supportive results related to the model were obtained by energy filtered transmission electron microscopy, X-ray diffraction, Raman spectroscopy and Fourier Transform infrared analysis. Elsevier 2011-09-01 Article PeerReviewed Wong, Y.H. and Cheong, K.Y. (2011) Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas. Journal of Alloys and Compounds, 509 (35). pp. 8728-8737. ISSN 0925-8388 http://www.sciencedirect.com/science/article/pii/S0925838811013235 http://dx.doi.org/10.1016/j.jallcom.2011.06.041
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic TA Engineering (General). Civil engineering (General)
spellingShingle TA Engineering (General). Civil engineering (General)
Wong, Y.H.
Cheong, K.Y.
Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
description Formation of ZrO2 by simultaneous thermal oxidation and nitridation in nitrous oxide of sputtered Zr on Si substrate is reported here for the first time. Sputtered Zr on Si substrate and followed by oxidation and nitridation in nitrous oxide ambient at 700 °C for various durations (5–20 min) have been systematically investigated. The structural and chemical properties of the samples were examined. Chemical depth profiles of the samples have been evaluated by X-ray photoelectron spectroscopy. Stoichiometric Zr–O (ZrO2) and its interfacial layer consisted of mixed sub-stoichiometric Zr–O, Zr–N, Zr–Si–O, Si–N, and/or Si–O–N phases were identified. A possible model related to the oxidation and nitridation mechanisms has been proposed and explained. Supportive results related to the model were obtained by energy filtered transmission electron microscopy, X-ray diffraction, Raman spectroscopy and Fourier Transform infrared analysis.
format Article
author Wong, Y.H.
Cheong, K.Y.
author_facet Wong, Y.H.
Cheong, K.Y.
author_sort Wong, Y.H.
title Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
title_short Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
title_full Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
title_fullStr Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
title_full_unstemmed Thermal oxidation and nitridation of sputtered Zr thin film on Si via N2O gas
title_sort thermal oxidation and nitridation of sputtered zr thin film on si via n2o gas
publisher Elsevier
publishDate 2011
url http://eprints.um.edu.my/12998/
http://www.sciencedirect.com/science/article/pii/S0925838811013235
http://dx.doi.org/10.1016/j.jallcom.2011.06.041
_version_ 1643689433801687040
score 13.211869

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