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Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere

Crystalline copper films were deposited by aerosol-assisted chemical vapor deposition (AACVD) in the absence of hydrogen from two newly synthesized complexes [Cu(deae)(TFA)](4)center dot 1.25THF (1) and [Cu(4)(OAc)(6)(bdmap)(2)(H(2)O)(2)]center dot 4H(2)O (2) [deae = N, N-diethylaminoethanolate, TFA...

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Main Authors: Shahid, M., Mazhar, M., Hamid, M., Brien, P.O', Malik, M.A., Helliwell, M.
Format: Article
Published: John Wiley & Sons 2010
Subjects:
Q Science (General)
Online Access:http://eprints.um.edu.my/12274/
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spelling my.um.eprints.122742015-01-20T03:02:59Z http://eprints.um.edu.my/12274/ Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere Shahid, M. Mazhar, M. Hamid, M. Brien, P.O' Malik, M.A. Helliwell, M. Q Science (General) Crystalline copper films were deposited by aerosol-assisted chemical vapor deposition (AACVD) in the absence of hydrogen from two newly synthesized complexes [Cu(deae)(TFA)](4)center dot 1.25THF (1) and [Cu(4)(OAc)(6)(bdmap)(2)(H(2)O)(2)]center dot 4H(2)O (2) [deae = N, N-diethylaminoethanolate, TFA = trifloroacetate, OAc = acetate and bdmap = 1,3-bis(dimethylamino)-2-propanolato]. These precursors were prepared in high yield using mixed ligands and crystallized in tetragonal and triclinic crystal systems with space groups 14(1)/a and P-1. Complexes 1 and 2 thermally decomposed at 290 and 250 degrees C, respectively, to yield copper films which were characterized by SEM/EDX for their morphology and composition and PXRD for their crystallinity and phase. These films have smooth morphologies with particle sizes within the range of 0.3-0.6 mu m and may find applications in fabrication of ultralarge-scale integrated circuits. Copyright (C) 2010 John Wiley & Sons, Ltd. John Wiley & Sons 2010 Article PeerReviewed Shahid, M. and Mazhar, M. and Hamid, M. and Brien, P.O' and Malik, M.A. and Helliwell, M. (2010) Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere. Applied Organometallic Chemistry, 24 (10). pp. 714-720. ISSN 0268-2605
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic Q Science (General)
spellingShingle Q Science (General)
Shahid, M.
Mazhar, M.
Hamid, M.
Brien, P.O'
Malik, M.A.
Helliwell, M.
Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
description Crystalline copper films were deposited by aerosol-assisted chemical vapor deposition (AACVD) in the absence of hydrogen from two newly synthesized complexes [Cu(deae)(TFA)](4)center dot 1.25THF (1) and [Cu(4)(OAc)(6)(bdmap)(2)(H(2)O)(2)]center dot 4H(2)O (2) [deae = N, N-diethylaminoethanolate, TFA = trifloroacetate, OAc = acetate and bdmap = 1,3-bis(dimethylamino)-2-propanolato]. These precursors were prepared in high yield using mixed ligands and crystallized in tetragonal and triclinic crystal systems with space groups 14(1)/a and P-1. Complexes 1 and 2 thermally decomposed at 290 and 250 degrees C, respectively, to yield copper films which were characterized by SEM/EDX for their morphology and composition and PXRD for their crystallinity and phase. These films have smooth morphologies with particle sizes within the range of 0.3-0.6 mu m and may find applications in fabrication of ultralarge-scale integrated circuits. Copyright (C) 2010 John Wiley & Sons, Ltd.
format Article
author Shahid, M.
Mazhar, M.
Hamid, M.
Brien, P.O'
Malik, M.A.
Helliwell, M.
author_facet Shahid, M.
Mazhar, M.
Hamid, M.
Brien, P.O'
Malik, M.A.
Helliwell, M.
author_sort Shahid, M.
title Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
title_short Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
title_full Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
title_fullStr Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
title_full_unstemmed Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere
title_sort deposition of crystalline copper films from tetranuclear copper (ii) complexes without application of reducing atmosphere
publisher John Wiley & Sons
publishDate 2010
url http://eprints.um.edu.my/12274/
_version_ 1643689263674425344
score 13.211869

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