Effect of oxide type and thickness towards NMOS I-V characteristics / Farah Adibah Ali
Silicon dioxide (SiO2) is the gate component on N-type Metal Oxide Semiconductor (NMOS) which play a very important role in the transistor operation. Growing SiO2 on the wafer substrate can be done by two methods which are by dry and wet oxidation. These two methods have different characteristics. H...
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| フォーマット: | Student Project |
| 言語: | English |
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2010
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| オンライン･アクセス: | https://ir.uitm.edu.my/id/eprint/45217/1/45217.pdf https://ir.uitm.edu.my/id/eprint/45217/ |
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