Fabrication and characterization of 130nm NMOS using silvaco software / Mas Fezah Latib

This paper presents to find the sequence of dominance for factors that determine the performance of a 130nm technology NMOS transistor. Going to 130nm, requires a lot of changes in the fabrication technique. The supply and threshold voltages will have to continually scale to sustain performance incr...

全面介紹

Saved in:
書目詳細資料
主要作者: Latib, Mas Fezah
格式: Thesis
語言:English
出版: 2007
主題:
在線閱讀:https://ir.uitm.edu.my/id/eprint/102919/1/102919.pdf
https://ir.uitm.edu.my/id/eprint/102919/
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!