Fabrication and characterization of 130nm NMOS using silvaco software / Mas Fezah Latib
This paper presents to find the sequence of dominance for factors that determine the performance of a 130nm technology NMOS transistor. Going to 130nm, requires a lot of changes in the fabrication technique. The supply and threshold voltages will have to continually scale to sustain performance incr...
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| フォーマット: | 学位論文 |
| 言語: | English |
| 出版事項: |
2007
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| 主題: | |
| オンライン･アクセス: | https://ir.uitm.edu.my/id/eprint/102919/1/102919.pdf https://ir.uitm.edu.my/id/eprint/102919/ |
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