Modeling and fabrication of CMOS surface acoustic wave resonators
A fully integrated two-port surface acoustic wave (SAW) resonator, fabricated using a standard 0.6- m complementary metal–oxide semiconductor (CMOS) process is described in this paper. Only three micromachining processes, namely, reactive ion etching, zinc–oxide deposition, and wet etching, impleme...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2007
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/1933/4/04195673.pdf http://irep.iium.edu.my/1933/ http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4195673&tag=1 |
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