Optimization of titanium silicide formation on boron doped silicon using statistical design
The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate...
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Universiti Kebangsaan Malaysia
2000
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| 在線閱讀: | http://journalarticle.ukm.my/3790/ http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html |
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my-ukm.journal.37902012-03-20T02:19:13Z http://journalarticle.ukm.my/3790/ Optimization of titanium silicide formation on boron doped silicon using statistical design Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari, The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate three effects in eight combination runs. The analysis of variance revealed that, the second heat treatment temperature was significant and being the main contributing factors to the final sheet resistance of the titanium silicide. The first heat treatment temperature and the second heat treatment time were found not important. Universiti Kebangsaan Malaysia 2000 Article PeerReviewed Uda Hashim, and Abu Hassan Shaari, and Burhanudin Yeop Majlis, and Sahbudin Shaari, (2000) Optimization of titanium silicide formation on boron doped silicon using statistical design. Sains Malaysiana, 29 . pp. 163-170. ISSN 0126-6039 http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html |
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Universiti Kebangsaan Malaysia |
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Perpustakaan Tun Sri Lanang Library |
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Asia |
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Malaysia |
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Universiti Kebangsaan Malaysia |
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| description |
The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate three effects in eight combination runs. The analysis of variance revealed that, the second heat treatment temperature was significant and being the main contributing factors to the final sheet resistance of the titanium silicide. The first heat treatment temperature and the second heat treatment time were found not important. |
| format |
Article |
| author |
Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari, |
| spellingShingle |
Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari, Optimization of titanium silicide formation on boron doped silicon using statistical design |
| author_facet |
Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari, |
| author_sort |
Uda Hashim, |
| title |
Optimization of titanium silicide formation on boron doped silicon using statistical design |
| title_short |
Optimization of titanium silicide formation on boron doped silicon using statistical design |
| title_full |
Optimization of titanium silicide formation on boron doped silicon using statistical design |
| title_fullStr |
Optimization of titanium silicide formation on boron doped silicon using statistical design |
| title_full_unstemmed |
Optimization of titanium silicide formation on boron doped silicon using statistical design |
| title_sort |
optimization of titanium silicide formation on boron doped silicon using statistical design |
| publisher |
Universiti Kebangsaan Malaysia |
| publishDate |
2000 |
| url |
http://journalarticle.ukm.my/3790/ http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html |
| _version_ |
1643735852789006336 |
| score |
13.251813 |