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Optimization of titanium silicide formation on boron doped silicon using statistical design

The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate...

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主要な著者: Uda Hashim,, Abu Hassan Shaari,, Burhanudin Yeop Majlis,, Sahbudin Shaari,
フォーマット: 論文
出版事項: Universiti Kebangsaan Malaysia 2000
オンライン･アクセス:http://journalarticle.ukm.my/3790/
http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html
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spelling my-ukm.journal.37902012-03-20T02:19:13Z http://journalarticle.ukm.my/3790/ Optimization of titanium silicide formation on boron doped silicon using statistical design Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari, The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate three effects in eight combination runs. The analysis of variance revealed that, the second heat treatment temperature was significant and being the main contributing factors to the final sheet resistance of the titanium silicide. The first heat treatment temperature and the second heat treatment time were found not important. Universiti Kebangsaan Malaysia 2000 Article PeerReviewed Uda Hashim, and Abu Hassan Shaari, and Burhanudin Yeop Majlis, and Sahbudin Shaari, (2000) Optimization of titanium silicide formation on boron doped silicon using statistical design. Sains Malaysiana, 29 . pp. 163-170. ISSN 0126-6039 http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html
institution Universiti Kebangsaan Malaysia
building Perpustakaan Tun Sri Lanang Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Kebangsaan Malaysia
content_source UKM Journal Article Repository
url_provider http://journalarticle.ukm.my/
description The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate three effects in eight combination runs. The analysis of variance revealed that, the second heat treatment temperature was significant and being the main contributing factors to the final sheet resistance of the titanium silicide. The first heat treatment temperature and the second heat treatment time were found not important.
format Article
author Uda Hashim,
Abu Hassan Shaari,
Burhanudin Yeop Majlis,
Sahbudin Shaari,
spellingShingle Uda Hashim,
Abu Hassan Shaari,
Burhanudin Yeop Majlis,
Sahbudin Shaari,
Optimization of titanium silicide formation on boron doped silicon using statistical design
author_facet Uda Hashim,
Abu Hassan Shaari,
Burhanudin Yeop Majlis,
Sahbudin Shaari,
author_sort Uda Hashim,
title Optimization of titanium silicide formation on boron doped silicon using statistical design
title_short Optimization of titanium silicide formation on boron doped silicon using statistical design
title_full Optimization of titanium silicide formation on boron doped silicon using statistical design
title_fullStr Optimization of titanium silicide formation on boron doped silicon using statistical design
title_full_unstemmed Optimization of titanium silicide formation on boron doped silicon using statistical design
title_sort optimization of titanium silicide formation on boron doped silicon using statistical design
publisher Universiti Kebangsaan Malaysia
publishDate 2000
url http://journalarticle.ukm.my/3790/
http://www.ukm.my/jsm/english_journals/vol29_2000/vol29_00page163-170.html
_version_ 1643735852789006336
score 13.250246

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