Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark profile is asymmetric, a change...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
2007
|
| Online Access: | http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf http://journalarticle.ukm.my/1459/ http://www.ukm.my/jkukm/index.php/jkukm |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|