Investigation on the ohmic characteristic of Ni/Ti/4H-SiC
Ohmic contact is important for silicon carbide (SiC) devices such as Schottky diode, junction field effect transistor (JFET) and metal oxide transistor (MOSFET). The effect of post metallization annealing (PMA) on the ohmic characteristics of Ni/Ti/4H-SiC is investigated. The samples were annealed u...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | en |
| Published: |
Institute of Advanced Engineering and Science
2021
|
| Online Access: | http://eprints.utem.edu.my/id/eprint/25845/2/3174-7379-1-PB.PDF http://eprints.utem.edu.my/id/eprint/25845/ https://beei.org/index.php/EEI/article/view/3174/2318 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!
