Han, S., Tong, G., Richard, R., Meriam Ab, G., Rasat, M., & Rahman, S. (2006). Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition.
Chicago Style (17th ed.) CitationHan, S.C, G.B Tong, R. Richard, G.S Meriam Ab, M.M Rasat, and S.A Rahman. Nanocrystalline Silicon Thin Films by RF Plasma Enhanced Chemical Vapour Deposition. 2006.
MLA (9th ed.) CitationHan, S.C, et al. Nanocrystalline Silicon Thin Films by RF Plasma Enhanced Chemical Vapour Deposition. 2006.
Warning: These citations may not always be 100% accurate.
