Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure rat...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Published: |
2006
|
| Subjects: | |
| Online Access: | http://eprints.um.edu.my/7365/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|