In-situ tuning of Sn doped In2O3 (ITO) films properties by controlling deposition Argon/Oxygen flow
In this work, we report that the properties of Sn-doped In 2 O 3 (ITO) can be properly tuned by varying Argon/ Oxygen (Ar/O 2 ) percentage during the sputtering process from 7% O 2 to 93% O 2 . The characteristics of the ITO grown in oxygen deficient to the oxygen-rich condition are properly studied...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Published: |
Elsevier
2019
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/23894/ https://doi.org/10.1016/j.apsusc.2019.01.123 |
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