Growth of plasma-enhanced chemical vapour deposition and hot filament plasma-enhanced chemical vapour deposition transfer-free graphene using a nickel catalyst

This paper investigates the effects of radiant heat from implementing a hot filament (HF) in an existing Plasma-enhanced Chemical Vapour Deposition (PECVD) system on the growth of transfer-free graphene. The fabrication and properties of the transfer-free graphene grown using the HF-PECVD technique...

Full description

Saved in:
Bibliographic Details
Main Authors: Othman, Maisara, Ritikos, Richard, Rahman, Saadah Abdul
Format: Article
Published: Elsevier 2019
Subjects:
Online Access:http://eprints.um.edu.my/23783/
https://doi.org/10.1016/j.tsf.2019.06.045
Tags: Add Tag
No Tags, Be the first to tag this record!