Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography
This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 th...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Published: |
Springer Verlag (Germany)
2018
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/22485/ https://doi.org/10.1007/s00542-017-3581-8 |
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| Summary: | This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 thin film has been coated. The optimization of the process parameters includes the duration of a two-step pre- and post-baking process, UV exposure dosage, and finally chemical developing time with constant agitation. This produces recipe produces micro-channels with high contrast edges and thickness below 100 nm. The dimensions achieved using this approach has potential applications in sub-micron optical waveguides and nanoelectromechanical (NEMS) devices. |
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