Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature
Nanostructured hydrogenated carbon nitride (CNx:H) thin films were synthesized on a crystal silicon substrate at lowdeposition temperature by radio-frequency plasma-enhanced chemical vapor deposition (PECVD). Methane and nitrogen were the precursor gases used in this deposition process. The effects...
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| Main Authors: | , , , |
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| Format: | Article |
| Published: |
MDPI
2017
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| Online Access: | http://eprints.um.edu.my/19137/ http://dx.doi.org/10.3390/ma10020102 |
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