Multi-phase structured hydrogenated amorphous silicon carbon nitride thin films grown by plasma enhanced chemical vapour deposition

In this work, hydrogenated amorphous silicon carbon nitride (a-SiCN:H) films were grown by plasma-enhanced chemical vapour deposition (PECVD) process using SiH4, CH4 and N2 gas discharge. The effects of N2 flow-rate on the structure, optical as well as photoluminescence properties were investigated....

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Bibliographic Details

Main Authors:	Abdul Rahman, M.A., Chiu, W.S., Haw, C.Y., Badaruddin, R., Tehrani, F.S., Rusop, M., Khiew, P., Rahman, S.A.
Format:	Article
Published:	Elsevier 2017
Subjects:	QC Physics
Online Access:	http://eprints.um.edu.my/17559/ https://doi.org/10.1016/j.jallcom.2017.05.289
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