Comparison of oxidized/nitrided Zr thin films on Si and SiC substrates
This work utilizes simultaneous thermal oxidation and nitridation technique to transform sputtered Zr to ZrO2 and to Zr-oxynitride thin films on Si and SiC substrates, respectively, in nitrous oxide gas ambient. Various characterization techniques such as X-ray photoelectron spectroscopy, energy-fil...
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| Main Authors: | , |
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| Format: | Article |
| Published: |
Elsevier
2013
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/13007/ http://www.sciencedirect.com/science/article/pii/S0272884212010802 http://dx.doi.org/10.1016/j.ceramint.2012.10.117 |
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