Parameter optimization of sputtered Ti interlayer using Taguchi method
The aim of this study was to optimize the process of coating a thin Ti film using a PVD magnetron sputtering system. The Ti thin film acted as an interlayer sandwiched between a substrate and a hard TiSiN coating. The substrates used were glass and high speed steel (HSS). An optimization of the proc...
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| Main Authors: | , , |
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| Format: | Article |
| Published: |
University of Malaya
2011
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/11824/ http://ejum.fsktm.um.edu.my/article/1097.pdf |
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