Particle contamination detection in plasma etching process using Artificial Neural Network

Particle contamination on wafer during fabrication process has become major issue in semiconductor manufacturing. Particles on wafer can cause the circuit to malfunction affecting manufacturing cost and productivity. Currently, detection of particles is conducted after the etching process was comple...

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Bibliographic Details

Main Author:	Mohammad Hanafi, Muhammad Aqil
Format:	Student Project
Language:	en
Published:	2017
Subjects:	Semiconductors
Online Access:	https://ir.uitm.edu.my/id/eprint/132685/1/132671.PDF https://ir.uitm.edu.my/id/eprint/132685/
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