Particle contamination detection in plasma etching process using Artificial Neural Network
Particle contamination on wafer during fabrication process has become major issue in semiconductor manufacturing. Particles on wafer can cause the circuit to malfunction affecting manufacturing cost and productivity. Currently, detection of particles is conducted after the etching process was comple...
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| Format: | Student Project |
| Language: | en |
| Published: |
2017
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| Online Access: | https://ir.uitm.edu.my/id/eprint/132685/1/132671.PDF https://ir.uitm.edu.my/id/eprint/132685/ |
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