Effect of nitrogen doping in amorphous carbon thin films grown by Thermal Chemical Vapor Deposition (CVD) method: article / Maisarah Mohd Robat
Thin films of amorphous carbon with different nitrogen flow rates were deposited on quartz substrate by Thermal Chemical Vapor Deposition (CVD) technique. Camphor oil was used as the precursor while argon and nitrogen were used as carrier gas. The electrical, optical and structural properties were...
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| Format: | Article |
| Language: | en |
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2012
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| Online Access: | https://ir.uitm.edu.my/id/eprint/114557/1/114557.pdf https://ir.uitm.edu.my/id/eprint/114557/ |
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