Reduction of defects on microstructure aluminium nitride using high temperature annealing heat treatment

Aluminium Nitride (AlN) is a ceramic 111-nitride material that is used widely as components in functional devices. Besides good thermal conductivity, it also has a high band gap in emitting light which is 6 eV. AlN thin film is grown on the sapphire substrate (0001). However, lattice mismatch bet...

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Bibliographic Details

Main Authors:	Tanasta, Z., Muhamad, Pauziah, Kuwano, Noriyuki, Mohd Yatim, Norfazrina Hayati, Unuh, Mohd Hishamuddin
Format:	Proceeding Paper
Language:	en en
Published:	Institute of Physics Publishing 2018
Subjects:	TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery
Online Access:	http://irep.iium.edu.my/65199/1/65199_Reduction%20of%20Defects%20on%20Microstructure%20Aluminium_conference%20article.pdf http://irep.iium.edu.my/65199/2/65199_Reduction%20of%20Defects%20on%20Microstructure%20Aluminium_scopus.pdf http://irep.iium.edu.my/65199/ http://iopscience.iop.org/article/10.1088/1757-899X/328/1/012019/pdf
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