Fabrication and characterisation of resistive nanocrystalline graphite
This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties o...
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| Main Authors: | , , , , , |
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| 格式: | Conference or Workshop Item |
| 語言: | English |
| 出版: |
2021
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| 主題: | |
| 在線閱讀: | http://eprints.utm.my/id/eprint/95958/1/SMSultan2021_FabricationandCharacterisation.pdf http://eprints.utm.my/id/eprint/95958/ http://dx.doi.org/10.1109/RSM52397.2021.9511601 |
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