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Fabrication and characterisation of resistive nanocrystalline graphite

This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties o...

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Main Authors: Sultan, S. M., Pu, S. H., Fishlock, S. J., Chong, H. M. H., Wah, L. H., McBride, J. W.
Format: Conference or Workshop Item
Language:English
Published: 2021
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://eprints.utm.my/id/eprint/95958/1/SMSultan2021_FabricationandCharacterisation.pdf
http://eprints.utm.my/id/eprint/95958/
http://dx.doi.org/10.1109/RSM52397.2021.9511601
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spelling my.utm.959582022-07-01T06:23:46Z http://eprints.utm.my/id/eprint/95958/ Fabrication and characterisation of resistive nanocrystalline graphite Sultan, S. M. Pu, S. H. Fishlock, S. J. Chong, H. M. H. Wah, L. H. McBride, J. W. TK Electrical engineering. Electronics Nuclear engineering This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties of the resistors produced were investigated. The average grain size of the NCG thin film is 35 nm with 0.8 nm of surface roughness. The electrical characterization of the NCG strips show metal-like behaviour in which the resistance is proportional to the strip lengths. The sheet resistance is found to be 39 kohm/sq which is two orders of magnitude larger than graphene deposited using Chemical Vapour Deposition. This indicates the carrier transport across grain boundaries has a large influence on the overall resistance of the device. However, the nano-sized grains on the NCG material could be used to enhance the sensitivity of the material towards the environment. 2021 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/95958/1/SMSultan2021_FabricationandCharacterisation.pdf Sultan, S. M. and Pu, S. H. and Fishlock, S. J. and Chong, H. M. H. and Wah, L. H. and McBride, J. W. (2021) Fabrication and characterisation of resistive nanocrystalline graphite. In: 13th IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2021, 2 August 2021 - 4 August 2021, Virtual, Kuala Lumpur. http://dx.doi.org/10.1109/RSM52397.2021.9511601
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Sultan, S. M.
Pu, S. H.
Fishlock, S. J.
Chong, H. M. H.
Wah, L. H.
McBride, J. W.
Fabrication and characterisation of resistive nanocrystalline graphite
description This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties of the resistors produced were investigated. The average grain size of the NCG thin film is 35 nm with 0.8 nm of surface roughness. The electrical characterization of the NCG strips show metal-like behaviour in which the resistance is proportional to the strip lengths. The sheet resistance is found to be 39 kohm/sq which is two orders of magnitude larger than graphene deposited using Chemical Vapour Deposition. This indicates the carrier transport across grain boundaries has a large influence on the overall resistance of the device. However, the nano-sized grains on the NCG material could be used to enhance the sensitivity of the material towards the environment.
format Conference or Workshop Item
author Sultan, S. M.
Pu, S. H.
Fishlock, S. J.
Chong, H. M. H.
Wah, L. H.
McBride, J. W.
author_facet Sultan, S. M.
Pu, S. H.
Fishlock, S. J.
Chong, H. M. H.
Wah, L. H.
McBride, J. W.
author_sort Sultan, S. M.
title Fabrication and characterisation of resistive nanocrystalline graphite
title_short Fabrication and characterisation of resistive nanocrystalline graphite
title_full Fabrication and characterisation of resistive nanocrystalline graphite
title_fullStr Fabrication and characterisation of resistive nanocrystalline graphite
title_full_unstemmed Fabrication and characterisation of resistive nanocrystalline graphite
title_sort fabrication and characterisation of resistive nanocrystalline graphite
publishDate 2021
url http://eprints.utm.my/id/eprint/95958/1/SMSultan2021_FabricationandCharacterisation.pdf
http://eprints.utm.my/id/eprint/95958/
http://dx.doi.org/10.1109/RSM52397.2021.9511601
_version_ 1738510304830029824
score 13.211869

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