Resistivity measurement of ZnO:AI films for solar cell

Aluminium doped Zinc Oxide films were deposited on glass slide by RF magnetron sputtering using a ZnO target mixed with A120J. All the films were growth in room temperature without intentional heating. The resistivity of the ZnO:AI films were measured using van der Pauw method in terms of the prepar...

詳細記述

保存先:
書誌詳細
主要な著者: Tan, Hang Khume, Md. Yusuf, Mohd. Nor, Ismail, Bakar, Wahab, Yussof, Othaman, Zulkafli
フォーマット: Conference or Workshop Item
言語:English
出版事項: 2006
主題:
オンライン・アクセス:http://eprints.utm.my/id/eprint/9302/1/TanHangKhume2006_ResistivityMeasurementofZnO.pdf
http://eprints.utm.my/id/eprint/9302/
タグ: タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
id my.utm.9302
record_format eprints
spelling my.utm.93022010-11-11T07:15:14Z http://eprints.utm.my/id/eprint/9302/ Resistivity measurement of ZnO:AI films for solar cell Tan, Hang Khume Md. Yusuf, Mohd. Nor Ismail, Bakar Wahab, Yussof Othaman, Zulkafli QC Physics Aluminium doped Zinc Oxide films were deposited on glass slide by RF magnetron sputtering using a ZnO target mixed with A120J. All the films were growth in room temperature without intentional heating. The resistivity of the ZnO:AI films were measured using van der Pauw method in terms of the preparation conditions such as RF power, working pressure, deposition time, O2 content in sputtering gas and target-substrate distance. Resistivity of the deposited films shows the following behaviours: decreases with the increasing RF power and film thickness while increase with increasing target substrate distance, and O2 content in sputtering gas. Resistivity for films prepared in different working pressure decreases with the Argon pressure but increased after the optimal pressure of 45mTorr. 2006-06 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/9302/1/TanHangKhume2006_ResistivityMeasurementofZnO.pdf Tan, Hang Khume and Md. Yusuf, Mohd. Nor and Ismail, Bakar and Wahab, Yussof and Othaman, Zulkafli (2006) Resistivity measurement of ZnO:AI films for solar cell. In: Proceedings of Annual Fundamental Science Seminar 2006 (AFSS 2006), 6th - 7th June 2006, Universiti Teknologi Malaysia, Skudai, Malaysia.
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
language English
topic QC Physics
spellingShingle QC Physics
Tan, Hang Khume
Md. Yusuf, Mohd. Nor
Ismail, Bakar
Wahab, Yussof
Othaman, Zulkafli
Resistivity measurement of ZnO:AI films for solar cell
description Aluminium doped Zinc Oxide films were deposited on glass slide by RF magnetron sputtering using a ZnO target mixed with A120J. All the films were growth in room temperature without intentional heating. The resistivity of the ZnO:AI films were measured using van der Pauw method in terms of the preparation conditions such as RF power, working pressure, deposition time, O2 content in sputtering gas and target-substrate distance. Resistivity of the deposited films shows the following behaviours: decreases with the increasing RF power and film thickness while increase with increasing target substrate distance, and O2 content in sputtering gas. Resistivity for films prepared in different working pressure decreases with the Argon pressure but increased after the optimal pressure of 45mTorr.
format Conference or Workshop Item
author Tan, Hang Khume
Md. Yusuf, Mohd. Nor
Ismail, Bakar
Wahab, Yussof
Othaman, Zulkafli
author_facet Tan, Hang Khume
Md. Yusuf, Mohd. Nor
Ismail, Bakar
Wahab, Yussof
Othaman, Zulkafli
author_sort Tan, Hang Khume
title Resistivity measurement of ZnO:AI films for solar cell
title_short Resistivity measurement of ZnO:AI films for solar cell
title_full Resistivity measurement of ZnO:AI films for solar cell
title_fullStr Resistivity measurement of ZnO:AI films for solar cell
title_full_unstemmed Resistivity measurement of ZnO:AI films for solar cell
title_sort resistivity measurement of zno:ai films for solar cell
publishDate 2006
url http://eprints.utm.my/id/eprint/9302/1/TanHangKhume2006_ResistivityMeasurementofZnO.pdf
http://eprints.utm.my/id/eprint/9302/
_version_ 1643645142379266048
score 13.251813