Sterilization of oyster mushroom crop residue substrate by using cold plasma technology

Traditional steaming method applied by mushroom entrepreneurs took long time (48 h) to complete the sterilization process. Moreover, improper steaming process causes contamination by soil-borne pathogens. This study will develop a new design by using cold plasma technology for crop residue substrate...

Full description

Saved in:
Bibliographic Details
Main Authors: Agun, Linda, Ahmad, Norhayati, Redzuan, Norizah, Idirs, Nor Azyan Syahirah, Mat Taib, Shazwin, Zakaria, Zarita, Raja Ibrahim, Raja Kamarulzaman
Format: Article
Published: Elsevier 2021
Subjects:
Online Access:http://eprints.utm.my/id/eprint/90112/
http://dx.doi.org/10.1016/j.matpr.2020.03.584
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.utm.90112
record_format eprints
spelling my.utm.901122021-03-31T06:21:17Z http://eprints.utm.my/id/eprint/90112/ Sterilization of oyster mushroom crop residue substrate by using cold plasma technology Agun, Linda Ahmad, Norhayati Redzuan, Norizah Idirs, Nor Azyan Syahirah Mat Taib, Shazwin Zakaria, Zarita Raja Ibrahim, Raja Kamarulzaman TJ Mechanical engineering and machinery Traditional steaming method applied by mushroom entrepreneurs took long time (48 h) to complete the sterilization process. Moreover, improper steaming process causes contamination by soil-borne pathogens. This study will develop a new design by using cold plasma technology for crop residue substrate sterilization process. The cold plasma discharge works as sterilization able to kill the soil-borne pathogens without effect the substrate properties. Hence, focus was intention to examine the efficiency of the dielectric barrier discharges cold plasma (DBD-CP) pen mixer system on the crop residue substrate sterilization process for oyster mushroom cultivation. This renewal process develops by using electric field from voltage breakdown to discharge the plasma. The plasma with variable sterilization duration of 0 min, 5 min, 10 min, 15 min, 20 min and 25 min will discharge on the crop residue substrate. The soil-borne pathogens inactivation occupies on agro-waste substrate will examine using bacteria colony forming unit (CFU) method. Data gathered shows the bacteria colonies reduce from 1.09 CFU/mL (0 min) to 1.58 CFU/mL (25 min) due to increment of sterilization time. The mushrooms cultivation duration also characterized. The mushroom fruiting body was successfully growth two days earlier on crop residue substrate sterilized using cold plasma technology. Results show 25 min of sterilization duration by cold plasma technology shows the best optimum time. As conclusion, cold plasma technology is an efficient technology and can be applied in oyster mushroom industry for crop residue substrate sterilization process. The mushroom productivity was increase, the mushroom fruiting body growth faster, the sterilization time was shorter and the soil-borne pathogens were reduced. Elsevier 2021 Article PeerReviewed Agun, Linda and Ahmad, Norhayati and Redzuan, Norizah and Idirs, Nor Azyan Syahirah and Mat Taib, Shazwin and Zakaria, Zarita and Raja Ibrahim, Raja Kamarulzaman (2021) Sterilization of oyster mushroom crop residue substrate by using cold plasma technology. Materials Today: Proceedings, 39 (2). pp. 903-906. ISSN 2214-7853 http://dx.doi.org/10.1016/j.matpr.2020.03.584
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic TJ Mechanical engineering and machinery
spellingShingle TJ Mechanical engineering and machinery
Agun, Linda
Ahmad, Norhayati
Redzuan, Norizah
Idirs, Nor Azyan Syahirah
Mat Taib, Shazwin
Zakaria, Zarita
Raja Ibrahim, Raja Kamarulzaman
Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
description Traditional steaming method applied by mushroom entrepreneurs took long time (48 h) to complete the sterilization process. Moreover, improper steaming process causes contamination by soil-borne pathogens. This study will develop a new design by using cold plasma technology for crop residue substrate sterilization process. The cold plasma discharge works as sterilization able to kill the soil-borne pathogens without effect the substrate properties. Hence, focus was intention to examine the efficiency of the dielectric barrier discharges cold plasma (DBD-CP) pen mixer system on the crop residue substrate sterilization process for oyster mushroom cultivation. This renewal process develops by using electric field from voltage breakdown to discharge the plasma. The plasma with variable sterilization duration of 0 min, 5 min, 10 min, 15 min, 20 min and 25 min will discharge on the crop residue substrate. The soil-borne pathogens inactivation occupies on agro-waste substrate will examine using bacteria colony forming unit (CFU) method. Data gathered shows the bacteria colonies reduce from 1.09 CFU/mL (0 min) to 1.58 CFU/mL (25 min) due to increment of sterilization time. The mushrooms cultivation duration also characterized. The mushroom fruiting body was successfully growth two days earlier on crop residue substrate sterilized using cold plasma technology. Results show 25 min of sterilization duration by cold plasma technology shows the best optimum time. As conclusion, cold plasma technology is an efficient technology and can be applied in oyster mushroom industry for crop residue substrate sterilization process. The mushroom productivity was increase, the mushroom fruiting body growth faster, the sterilization time was shorter and the soil-borne pathogens were reduced.
format Article
author Agun, Linda
Ahmad, Norhayati
Redzuan, Norizah
Idirs, Nor Azyan Syahirah
Mat Taib, Shazwin
Zakaria, Zarita
Raja Ibrahim, Raja Kamarulzaman
author_facet Agun, Linda
Ahmad, Norhayati
Redzuan, Norizah
Idirs, Nor Azyan Syahirah
Mat Taib, Shazwin
Zakaria, Zarita
Raja Ibrahim, Raja Kamarulzaman
author_sort Agun, Linda
title Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
title_short Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
title_full Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
title_fullStr Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
title_full_unstemmed Sterilization of oyster mushroom crop residue substrate by using cold plasma technology
title_sort sterilization of oyster mushroom crop residue substrate by using cold plasma technology
publisher Elsevier
publishDate 2021
url http://eprints.utm.my/id/eprint/90112/
http://dx.doi.org/10.1016/j.matpr.2020.03.584
_version_ 1696976263160266752
score 13.211869