Study on threshold voltage shifts and reliability in PFETs by high-voltage on-state and off-state stress

In recent decades, electronics have made much progress thanks to the scaling of silicon complementary metal-oxide-semiconductor (CMOS) very-large-scale integration (VLSI). Now, dimensions of state-of-the-art metal-oxide-semiconductor field effect transistors (MOSFETs) are as small as tens of nanomet...

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Bibliographic Details
Main Author: Alias, Nurul Ezaila
Format: Thesis
Language:English
Published: 2013
Subjects:
Online Access:http://eprints.utm.my/id/eprint/78380/1/NurulEzailaAliasPFS2013.pdf
http://eprints.utm.my/id/eprint/78380/
http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:98775
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