Fabrication parameters dependent morphology variation of silicon thin film
Achieving two dimensional quantum structure of silicon with welldefined tuneable morphology is an outstanding issue. We present the preliminary results on fabrication parameters dependent silicon thin film production using VHF-PECVD method. Five samples are prepared on Si(100) substrate with gold (A...
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| Main Authors: | , , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2015
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| Subjects: | |
| Online Access: | http://eprints.utm.my/id/eprint/63450/1/AbdKhamimIsmail2015_FabricationParametersDependentMorphologyVariationofSiliconThinFilm.pdf http://eprints.utm.my/id/eprint/63450/ |
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