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Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition

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Main Author: Hamidinezhad, Habib
Format: Thesis
Published: 2011
Subjects:
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Online Access:http://eprints.utm.my/id/eprint/31308/
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spelling my.utm.313082013-05-07T02:39:00Z http://eprints.utm.my/id/eprint/31308/ Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition Hamidinezhad, Habib Unspecified 2011 Thesis NonPeerReviewed Hamidinezhad, Habib (2011) Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition. PhD thesis, Universiti Teknologi Malaysia, Faculty of Science.
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic Unspecified
spellingShingle Unspecified
Hamidinezhad, Habib
Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
format Thesis
author Hamidinezhad, Habib
author_facet Hamidinezhad, Habib
author_sort Hamidinezhad, Habib
title Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
title_short Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
title_full Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
title_fullStr Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
title_full_unstemmed Structural characterization of silicon nanowires grown by a 150 MHz very high frequency plasma enhanced chemical vapor deposition
title_sort structural characterization of silicon nanowires grown by a 150 mhz very high frequency plasma enhanced chemical vapor deposition
publishDate 2011
url http://eprints.utm.my/id/eprint/31308/
_version_ 1643648723264208896
score 13.211869

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