SnS thin films prepared by encapsulated sulfurization
Tin sulphide (SnS) thin films were grown using a method called encapsulated sulfurization from the Sn/S stacked layers previously coated on a glass substrate at pressure 10-5 mbar and film thickness ratios; Sn: S= 1:1, 1:2, 1:3. In this technique the samples were placed in a carbon block and anneale...
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Persatuan Sains & Teknologi Keadaan Pepejal Malaysia
1996
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Online Access: | http://eprints.utm.my/id/eprint/2867/1/SnS_thin_films_prepared_by_encapsulated_sulfurization_V6.pdf http://eprints.utm.my/id/eprint/2867/ |
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my.utm.28672010-06-01T03:05:46Z http://eprints.utm.my/id/eprint/2867/ SnS thin films prepared by encapsulated sulfurization Sakrani, Samsudi D. Hutagalung, Sabar Wahab, Yusof Moin, Mastura QC Physics Tin sulphide (SnS) thin films were grown using a method called encapsulated sulfurization from the Sn/S stacked layers previously coated on a glass substrate at pressure 10-5 mbar and film thickness ratios; Sn: S= 1:1, 1:2, 1:3. In this technique the samples were placed in a carbon block and annealed in argon gas at temperatures between 260-450 oC for three hours to allow the formation of SnS thin films by chemical reaction which took place in the Sn/S bilayer. In the early stage (260 oC) Sn was sulfurized between 300-400 oC changed the process rapidly and dominantly into SnS with improved crystallinity. The measured resistivities were found to be between 0.65-2.92 Sm-1 over the range of substrate temperature concerned. Persatuan Sains & Teknologi Keadaan Pepejal Malaysia 1996 Article PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/2867/1/SnS_thin_films_prepared_by_encapsulated_sulfurization_V6.pdf Sakrani, Samsudi and D. Hutagalung, Sabar and Wahab, Yusof and Moin, Mastura (1996) SnS thin films prepared by encapsulated sulfurization. Buletin of Malaysian Solid State Science & Technology, 6 (2). pp. 43-50. ISSN 0128-5637 |
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QC Physics Sakrani, Samsudi D. Hutagalung, Sabar Wahab, Yusof Moin, Mastura SnS thin films prepared by encapsulated sulfurization |
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Tin sulphide (SnS) thin films were grown using a method called encapsulated sulfurization from the Sn/S stacked layers previously coated on a glass substrate at pressure 10-5 mbar and film thickness ratios; Sn: S= 1:1, 1:2, 1:3. In this technique the samples were placed in a carbon block and annealed in argon gas at temperatures between 260-450 oC for three hours to allow the formation of SnS thin films by chemical reaction which took place in the Sn/S bilayer. In the early stage (260 oC) Sn was sulfurized between 300-400 oC changed the process rapidly and dominantly into SnS with improved crystallinity. The measured resistivities were found to be between 0.65-2.92 Sm-1 over the range of substrate temperature concerned. |
format |
Article |
author |
Sakrani, Samsudi D. Hutagalung, Sabar Wahab, Yusof Moin, Mastura |
author_facet |
Sakrani, Samsudi D. Hutagalung, Sabar Wahab, Yusof Moin, Mastura |
author_sort |
Sakrani, Samsudi |
title |
SnS thin films prepared by encapsulated sulfurization |
title_short |
SnS thin films prepared by encapsulated sulfurization |
title_full |
SnS thin films prepared by encapsulated sulfurization |
title_fullStr |
SnS thin films prepared by encapsulated sulfurization |
title_full_unstemmed |
SnS thin films prepared by encapsulated sulfurization |
title_sort |
sns thin films prepared by encapsulated sulfurization |
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Persatuan Sains & Teknologi Keadaan Pepejal Malaysia |
publishDate |
1996 |
url |
http://eprints.utm.my/id/eprint/2867/1/SnS_thin_films_prepared_by_encapsulated_sulfurization_V6.pdf http://eprints.utm.my/id/eprint/2867/ |
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13.211869 |