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Optimization of physical vapour deposition coating process parameters using genetic algorithm

Optimization of thin film coating parameter is an important task to identify the required output. In the process of physical vapor deposition (PVD), two main issues of the PVD process are cost of manufacturing and customization of the cutting tool properties. In general, a proper choice of the coati...

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Main Author:	Mohammad Jarrah, Mu'ath Ibrahim
Format:	Thesis
Language:	English English
Published:	2014
Subjects:	T Technology (General) TA Engineering (General). Civil engineering (General)
Online Access:	http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdf http://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf http://eprints.utem.edu.my/id/eprint/14993/ https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=92149
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id	my.utem.eprints.14993
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spelling	my.utem.eprints.149932022-05-17T09:03:48Z http://eprints.utem.edu.my/id/eprint/14993/ Optimization of physical vapour deposition coating process parameters using genetic algorithm Mohammad Jarrah, Mu'ath Ibrahim T Technology (General) TA Engineering (General). Civil engineering (General) Optimization of thin film coating parameter is an important task to identify the required output. In the process of physical vapor deposition (PVD), two main issues of the PVD process are cost of manufacturing and customization of the cutting tool properties. In general, a proper choice of the coating process parameters is very important to find the best characteristics of coating and towards less material usage, reduced trial in experiment and less machine maintenance. The aim of this study is to identify optimal PVD coating process parameters. Three process parameters were selected which are nitrogen gas pressure (N2), argon gas pressure (Ar) and turntable speed (TT), while thin film grain size of titanium nitrite (TiN) was selected as an output response. In order to get output result, the three parameters were used to develop a polynomial quadratic equation that was designed using response surface methodology (RSM). Then, in order to optimize the coating process parameters, genetic algorithms (GAs) were used for the optimization work. The results showed that the optimized coating process parameters have lower grain size value compared to the actual experimental data and RSM with (≈6%) ratio and (≈0.03%) ratio, respectively. 2014 Thesis NonPeerReviewed text en http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdf text en http://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf Mohammad Jarrah, Mu'ath Ibrahim (2014) Optimization of physical vapour deposition coating process parameters using genetic algorithm. Masters thesis, Universiti Teknikal Malaysia Melaka. https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=92149
institution	Universiti Teknikal Malaysia Melaka
building	UTEM Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Teknikal Malaysia Melaka
content_source	UTEM Institutional Repository
url_provider	http://eprints.utem.edu.my/
language	English English
topic	T Technology (General) TA Engineering (General). Civil engineering (General)
spellingShingle	T Technology (General) TA Engineering (General). Civil engineering (General) Mohammad Jarrah, Mu'ath Ibrahim Optimization of physical vapour deposition coating process parameters using genetic algorithm
description	Optimization of thin film coating parameter is an important task to identify the required output. In the process of physical vapor deposition (PVD), two main issues of the PVD process are cost of manufacturing and customization of the cutting tool properties. In general, a proper choice of the coating process parameters is very important to find the best characteristics of coating and towards less material usage, reduced trial in experiment and less machine maintenance. The aim of this study is to identify optimal PVD coating process parameters. Three process parameters were selected which are nitrogen gas pressure (N2), argon gas pressure (Ar) and turntable speed (TT), while thin film grain size of titanium nitrite (TiN) was selected as an output response. In order to get output result, the three parameters were used to develop a polynomial quadratic equation that was designed using response surface methodology (RSM). Then, in order to optimize the coating process parameters, genetic algorithms (GAs) were used for the optimization work. The results showed that the optimized coating process parameters have lower grain size value compared to the actual experimental data and RSM with (≈6%) ratio and (≈0.03%) ratio, respectively.
format	Thesis
author	Mohammad Jarrah, Mu'ath Ibrahim
author_facet	Mohammad Jarrah, Mu'ath Ibrahim
author_sort	Mohammad Jarrah, Mu'ath Ibrahim
title	Optimization of physical vapour deposition coating process parameters using genetic algorithm
title_short	Optimization of physical vapour deposition coating process parameters using genetic algorithm
title_full	Optimization of physical vapour deposition coating process parameters using genetic algorithm
title_fullStr	Optimization of physical vapour deposition coating process parameters using genetic algorithm
title_full_unstemmed	Optimization of physical vapour deposition coating process parameters using genetic algorithm
title_sort	optimization of physical vapour deposition coating process parameters using genetic algorithm
publishDate	2014
url	http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdf http://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf http://eprints.utem.edu.my/id/eprint/14993/ https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=92149
_version_	1734303567483764736
score	13.211869

Optimization of physical vapour deposition coating process parameters using genetic algorithm

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