Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolith...
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2008
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Online Access: | http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf http://eprints.usm.my/9613/ |
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my.usm.eprints.9613 http://eprints.usm.my/9613/ Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Siow, Yuen Tien TR925-1050 Photomechanical processes Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography 2008-11 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf Siow, Yuen Tien (2008) Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Masters thesis, Universiti Sains Malaysia. |
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TR925-1050 Photomechanical processes Siow, Yuen Tien Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
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Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography.
The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography
|
format |
Thesis |
author |
Siow, Yuen Tien |
author_facet |
Siow, Yuen Tien |
author_sort |
Siow, Yuen Tien |
title |
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
title_short |
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
title_full |
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
title_fullStr |
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
title_full_unstemmed |
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. |
title_sort |
cycle time analysis for photolithography tools in semiconductor manufacturing industry with simulation model : a case study [tr940. s618 2008 f rb]. |
publishDate |
2008 |
url |
http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf http://eprints.usm.my/9613/ |
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