Method and apparatus for removing moisture from at least one product
An apparatus (100) for removing moisture from at least one product, the apparatus (100) includes at least one dryer (105) having at least one adsorbent desiccant therein for drying, a gas source (110) in fluid communication with the at least one dryer (105) having the at least one adsorbent desiccan...
Saved in:
Main Authors: | , |
---|---|
Format: | Patent |
Published: |
2012
|
Online Access: | http://psasir.upm.edu.my/id/eprint/33577/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
id |
my.upm.eprints.33577 |
---|---|
record_format |
eprints |
spelling |
my.upm.eprints.335772016-01-19T01:55:50Z http://psasir.upm.edu.my/id/eprint/33577/ Method and apparatus for removing moisture from at least one product Chong, Gun Hean Spotar, Sergey An apparatus (100) for removing moisture from at least one product, the apparatus (100) includes at least one dryer (105) having at least one adsorbent desiccant therein for drying, a gas source (110) in fluid communication with the at least one dryer (105) having the at least one adsorbent desiccant therein for drying and extracting moisture from gas supplied by the gas source (110) to produce a dried gas, at least one heater (115) to raise temperature of the dried gas blown into at least one drying chamber (120) for drying the at least one product and at least one level control element (125) that closes to complete an electrical circuit when sensing a predetermined level of flow pressure of the dried gas is sufficient for maintaining proper drying operation. 2012-12-18 Patent NonPeerReviewed Chong Gun Hean (2012) Method and apparatus for removing moisture from at least one product. PI2012701215. |
institution |
Universiti Putra Malaysia |
building |
UPM Library |
collection |
Institutional Repository |
continent |
Asia |
country |
Malaysia |
content_provider |
Universiti Putra Malaysia |
content_source |
UPM Institutional Repository |
url_provider |
http://psasir.upm.edu.my/ |
description |
An apparatus (100) for removing moisture from at least one product, the apparatus (100) includes at least one dryer (105) having at least one adsorbent desiccant therein for drying, a gas source (110) in fluid communication with the at least one dryer (105) having the at least one adsorbent desiccant therein for drying and extracting moisture from gas supplied by the gas source (110) to produce a dried gas, at least one heater (115) to raise temperature of the dried gas blown into at least one drying chamber (120) for drying the at least one product and at least one level control element (125) that closes to complete an electrical circuit when sensing a predetermined level of flow pressure of the dried gas is sufficient for maintaining proper drying operation. |
format |
Patent |
author |
Chong, Gun Hean Spotar, Sergey |
spellingShingle |
Chong, Gun Hean Spotar, Sergey Method and apparatus for removing moisture from at least one product |
author_facet |
Chong, Gun Hean Spotar, Sergey |
author_sort |
Chong, Gun Hean |
title |
Method and apparatus for removing moisture from at least one product |
title_short |
Method and apparatus for removing moisture from at least one product |
title_full |
Method and apparatus for removing moisture from at least one product |
title_fullStr |
Method and apparatus for removing moisture from at least one product |
title_full_unstemmed |
Method and apparatus for removing moisture from at least one product |
title_sort |
method and apparatus for removing moisture from at least one product |
publishDate |
2012 |
url |
http://psasir.upm.edu.my/id/eprint/33577/ |
_version_ |
1643830913098842112 |
score |
13.211869 |