The snomipede : a parallel platform for scanning near-field photolithography.

Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with othe...

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Main Authors: Ul-Haq, Ehtsham, Zhuming, Liu, Zhang, Yuan, Alang Ahmad, Shahrul Ainliah, Wong, Lu Shin, Hobbs, Jamie K., Leggett, Graham J., Micklefield, Jason, Roberts, Clive J., Weaver, John M. R.
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Language:English
English
Published: Materials Research Society 2011
Online Access:http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf
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spelling my.upm.eprints.252372015-10-07T02:32:22Z http://psasir.upm.edu.my/id/eprint/25237/ The snomipede : a parallel platform for scanning near-field photolithography. Ul-Haq, Ehtsham Zhuming, Liu Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with other scanning probe techniques, SNP has previously been considered a serial process, hindering its use in many applications. IBM’s “Millipede” addresses this problem by utilizing an array of local probes operating in parallel. Here, we describe the construction of two instruments (Snomipedes) that integrate near-field optical methods into the parallel probe paradigm and promise the integration of top–down and bottom–up fabrication methods over macroscopic areas. Both are capable of performing near-field lithography with 16 probes in parallel spanning approximately 2 mm. The instruments can work in both ambient and liquid environments, key to many applications in nanobiology. In both, separate control of writing is possible for each probe. We demonstrate the deprotection of self-assembled monolayers of alkylsilanes with photocleavable protecting groups and subsequent growth of nanostructured polymer brushes from these nanopatterned surfaces by atom-transfer radical polymerization. Materials Research Society 2011 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf Ul-Haq, Ehtsham and Zhuming, Liu and Zhang, Yuan and Alang Ahmad, Shahrul Ainliah and Wong, Lu Shin and Hobbs, Jamie K. and Leggett, Graham J. and Micklefield, Jason and Roberts, Clive J. and Weaver, John M. R. (2011) The snomipede : a parallel platform for scanning near-field photolithography. Journal of Materials Research, 26 (24). pp. 2997-3008. ISSN 0884-2914; ESSN:2044-5326 10.1557/jmr.2011.370 English
institution Universiti Putra Malaysia
building UPM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Putra Malaysia
content_source UPM Institutional Repository
url_provider http://psasir.upm.edu.my/
language English
English
description Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with other scanning probe techniques, SNP has previously been considered a serial process, hindering its use in many applications. IBM’s “Millipede” addresses this problem by utilizing an array of local probes operating in parallel. Here, we describe the construction of two instruments (Snomipedes) that integrate near-field optical methods into the parallel probe paradigm and promise the integration of top–down and bottom–up fabrication methods over macroscopic areas. Both are capable of performing near-field lithography with 16 probes in parallel spanning approximately 2 mm. The instruments can work in both ambient and liquid environments, key to many applications in nanobiology. In both, separate control of writing is possible for each probe. We demonstrate the deprotection of self-assembled monolayers of alkylsilanes with photocleavable protecting groups and subsequent growth of nanostructured polymer brushes from these nanopatterned surfaces by atom-transfer radical polymerization.
format Article
author Ul-Haq, Ehtsham
Zhuming, Liu
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
spellingShingle Ul-Haq, Ehtsham
Zhuming, Liu
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
The snomipede : a parallel platform for scanning near-field photolithography.
author_facet Ul-Haq, Ehtsham
Zhuming, Liu
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
author_sort Ul-Haq, Ehtsham
title The snomipede : a parallel platform for scanning near-field photolithography.
title_short The snomipede : a parallel platform for scanning near-field photolithography.
title_full The snomipede : a parallel platform for scanning near-field photolithography.
title_fullStr The snomipede : a parallel platform for scanning near-field photolithography.
title_full_unstemmed The snomipede : a parallel platform for scanning near-field photolithography.
title_sort snomipede : a parallel platform for scanning near-field photolithography.
publisher Materials Research Society
publishDate 2011
url http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf
http://psasir.upm.edu.my/id/eprint/25237/
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score 13.211869