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Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films

Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, re...

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Main Authors: Kassim, Anuar, Nagalingam, Saravanan, Tan, Wee Tee, Mohd Sharif, Atan, Abdullah, Dzulkefly Kuang, Haron, Md. Jelas, Ho, Soon Min
Format: Article
Language:English
Published: Science and Technology Information Institute 2009
Online Access:http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf
http://psasir.upm.edu.my/id/eprint/14222/
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spelling my.upm.eprints.142222015-09-28T00:42:41Z http://psasir.upm.edu.my/id/eprint/14222/ Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films Kassim, Anuar Nagalingam, Saravanan Tan, Wee Tee Mohd Sharif, Atan Abdullah, Dzulkefly Kuang Haron, Md. Jelas Ho, Soon Min Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, respectively. The optical properties were measured to determine transition type and band gap value. The thin films produced were found to be polycrystalline with orthorhombic structure. X-ray diffraction data showed that the most intense peak at 2θ = 30.2° which belongs to (221) plane. As the deposition period was increased up to 80 min, the film gradually grew thicker as shown by the AFM images. It is observed that the best crystallinity of film is obtained at pH 1.5. Also, AFM images revealed that the grains were distributed evenly over the substrate surface. The bandgap value was found to be 1.9 eV with direct transition. Science and Technology Information Institute 2009-12 Article NonPeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf Kassim, Anuar and Nagalingam, Saravanan and Tan, Wee Tee and Mohd Sharif, Atan and Abdullah, Dzulkefly Kuang and Haron, Md. Jelas and Ho, Soon Min (2009) Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films. Philippine Journal of Science, 138 (2). pp. 161-168. ISSN 0031-7683
institution Universiti Putra Malaysia
building UPM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Putra Malaysia
content_source UPM Institutional Repository
url_provider http://psasir.upm.edu.my/
language English
description Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, respectively. The optical properties were measured to determine transition type and band gap value. The thin films produced were found to be polycrystalline with orthorhombic structure. X-ray diffraction data showed that the most intense peak at 2θ = 30.2° which belongs to (221) plane. As the deposition period was increased up to 80 min, the film gradually grew thicker as shown by the AFM images. It is observed that the best crystallinity of film is obtained at pH 1.5. Also, AFM images revealed that the grains were distributed evenly over the substrate surface. The bandgap value was found to be 1.9 eV with direct transition.
format Article
author Kassim, Anuar
Nagalingam, Saravanan
Tan, Wee Tee
Mohd Sharif, Atan
Abdullah, Dzulkefly Kuang
Haron, Md. Jelas
Ho, Soon Min
spellingShingle Kassim, Anuar
Nagalingam, Saravanan
Tan, Wee Tee
Mohd Sharif, Atan
Abdullah, Dzulkefly Kuang
Haron, Md. Jelas
Ho, Soon Min
Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
author_facet Kassim, Anuar
Nagalingam, Saravanan
Tan, Wee Tee
Mohd Sharif, Atan
Abdullah, Dzulkefly Kuang
Haron, Md. Jelas
Ho, Soon Min
author_sort Kassim, Anuar
title Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_short Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_full Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_fullStr Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_full_unstemmed Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_sort effect of deposition period and ph on chemical bath deposited cu4sns4 thin films
publisher Science and Technology Information Institute
publishDate 2009
url http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf
http://psasir.upm.edu.my/id/eprint/14222/
_version_ 1643825569041743872
score 13.211869

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