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Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source

The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high deg...

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Main Author: Chakrabarty, C.K.
Format: Article
Language:en_US
Published: 2017
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spelling my.uniten.dspace-57482017-12-14T01:25:25Z Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source Chakrabarty, C.K. The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved. 2017-12-08T06:45:51Z 2017-12-08T06:45:51Z 2006 Article 10.1016/j.measurement.2006.03.003 en_US Measurement: Journal of the International Measurement Confederation Volume 39, Issue 8, October 2006, Pages 736-739
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
language en_US
description The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved.
format Article
author Chakrabarty, C.K.
spellingShingle Chakrabarty, C.K.
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
author_facet Chakrabarty, C.K.
author_sort Chakrabarty, C.K.
title Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
title_short Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
title_full Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
title_fullStr Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
title_full_unstemmed Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
title_sort magnetic field measurements for n2 and h2 discharges from a low frequency rf inductively coupled plasma source
publishDate 2017
_version_ 1644493765919899648
score 13.222552

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