Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package

This paper presents the effects of two different catalytic activation techniques on the thermal performance of flip chip heat spreaders. The two activation techniques investigated are i) thin nickel-copper strike and ii) galvanic initiation. Thermal diffusivity of these heat spreaders was studied us...

Full description

Saved in:
Bibliographic Details
Main Authors: Lim, V., Ahmad, I., Seng, F.C., Amin, N., Rasid, R.
Format:
Published: 2017
Online Access:http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5276
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.uniten.dspace-5276
record_format dspace
spelling my.uniten.dspace-52762017-11-15T02:57:13Z Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package Lim, V. Ahmad, I. Seng, F.C. Amin, N. Rasid, R. This paper presents the effects of two different catalytic activation techniques on the thermal performance of flip chip heat spreaders. The two activation techniques investigated are i) thin nickel-copper strike and ii) galvanic initiation. Thermal diffusivity of these heat spreaders was studied using the Nano-flash Apparatus [1]. High temperature storage tests were run to investigate the extent of intermetallic diffusion between the nickel and copper layers. The results obtained showed that heat spreaders processed with thin nickel-copper strike catalytic activation technique formed thick nickel-copper intermetallic layers compared to those processed with galvanic initiation. Nickel-copper intermetallic layers have lower thermal conductivity compared to pure copper [2]. As a result, heat spreaders processed with thin nickel copper strike have lower thermal diffusivity values averaged at 35-65W/mK XX compared to 60-85W/mK YY measured for those processed with galvanic-initiation. It is also discovered that the nickel-copper intermetallic layers of these heat spreaders grew thicker from 0.2μm at initial time until around 0.55μm after high temperature storage of 168 hours, further degrading the thermal diffusivity of these heat spreaders. As a conclusion, the galvanic initiation technique provides better thermal performance for heat spreaders used in semiconductor packages. 2017-11-15T02:57:13Z 2017-11-15T02:57:13Z 2008 http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5276
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
description This paper presents the effects of two different catalytic activation techniques on the thermal performance of flip chip heat spreaders. The two activation techniques investigated are i) thin nickel-copper strike and ii) galvanic initiation. Thermal diffusivity of these heat spreaders was studied using the Nano-flash Apparatus [1]. High temperature storage tests were run to investigate the extent of intermetallic diffusion between the nickel and copper layers. The results obtained showed that heat spreaders processed with thin nickel-copper strike catalytic activation technique formed thick nickel-copper intermetallic layers compared to those processed with galvanic initiation. Nickel-copper intermetallic layers have lower thermal conductivity compared to pure copper [2]. As a result, heat spreaders processed with thin nickel copper strike have lower thermal diffusivity values averaged at 35-65W/mK XX compared to 60-85W/mK YY measured for those processed with galvanic-initiation. It is also discovered that the nickel-copper intermetallic layers of these heat spreaders grew thicker from 0.2μm at initial time until around 0.55μm after high temperature storage of 168 hours, further degrading the thermal diffusivity of these heat spreaders. As a conclusion, the galvanic initiation technique provides better thermal performance for heat spreaders used in semiconductor packages.
format
author Lim, V.
Ahmad, I.
Seng, F.C.
Amin, N.
Rasid, R.
spellingShingle Lim, V.
Ahmad, I.
Seng, F.C.
Amin, N.
Rasid, R.
Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
author_facet Lim, V.
Ahmad, I.
Seng, F.C.
Amin, N.
Rasid, R.
author_sort Lim, V.
title Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
title_short Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
title_full Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
title_fullStr Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
title_full_unstemmed Characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
title_sort characterization of nickel plated copper heat spreaders with different catalytic activation processes for flip-chip ball grid array package
publishDate 2017
url http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5276
_version_ 1644493635776937984
score 13.211869