High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well
Silicon-on-insulator (SOI) based SiGe quantum well infrared pin photodiode has the potential of being a serious candidate for applications in sensing applications as well as in optical fiber communications. The present work investigates the performance of a virtual lateral PIN photodiode with a SiGe...
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my.uniten.dspace-52232017-11-15T02:56:46Z High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well Menon, P.S. Tasirin, S.K. Ahmad, I. Abdullah, S.F. Silicon-on-insulator (SOI) based SiGe quantum well infrared pin photodiode has the potential of being a serious candidate for applications in sensing applications as well as in optical fiber communications. The present work investigates the performance of a virtual lateral PIN photodiode with a SiGe/Si multi-quantum well structure. In this paper, 5 periods of stacked SiGe quantum wells were grown on Si(100). A lateral PIN photodiode consisting of the SiGe/Si multi-quantum well layers as the active absorption layer with intensity response in the 700-1600 nm wavelength range was demonstrated. The results obtained for responsivity, total quantum efficiency and frequency response were 0.89 A/W, 71% and 21 GHz respectively for design parameters of intrinsic region length of 6 μm, photoabsorption layer thickness of 50 μm, incident optical power of 1 mW/cm2 and bias voltage of 3 V. As a conclusion, the SiGe/Si multi-quantum well solution in achieving the desired high performance photodiode was achieved. © 2012 IEEE. 2017-11-15T02:56:46Z 2017-11-15T02:56:46Z 2012 http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5223 |
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Silicon-on-insulator (SOI) based SiGe quantum well infrared pin photodiode has the potential of being a serious candidate for applications in sensing applications as well as in optical fiber communications. The present work investigates the performance of a virtual lateral PIN photodiode with a SiGe/Si multi-quantum well structure. In this paper, 5 periods of stacked SiGe quantum wells were grown on Si(100). A lateral PIN photodiode consisting of the SiGe/Si multi-quantum well layers as the active absorption layer with intensity response in the 700-1600 nm wavelength range was demonstrated. The results obtained for responsivity, total quantum efficiency and frequency response were 0.89 A/W, 71% and 21 GHz respectively for design parameters of intrinsic region length of 6 μm, photoabsorption layer thickness of 50 μm, incident optical power of 1 mW/cm2 and bias voltage of 3 V. As a conclusion, the SiGe/Si multi-quantum well solution in achieving the desired high performance photodiode was achieved. © 2012 IEEE. |
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author |
Menon, P.S. Tasirin, S.K. Ahmad, I. Abdullah, S.F. |
spellingShingle |
Menon, P.S. Tasirin, S.K. Ahmad, I. Abdullah, S.F. High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
author_facet |
Menon, P.S. Tasirin, S.K. Ahmad, I. Abdullah, S.F. |
author_sort |
Menon, P.S. |
title |
High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
title_short |
High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
title_full |
High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
title_fullStr |
High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
title_full_unstemmed |
High performance of a SOI-based lateral PIN photodiode using SiGe/Si multilayer quantum well |
title_sort |
high performance of a soi-based lateral pin photodiode using sige/si multilayer quantum well |
publishDate |
2017 |
url |
http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5223 |
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1644493620224458752 |
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13.211869 |