Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod

The primary objective of this research is to synthesize ZnO vertical nanorods on a conductive substrate through a novel approach. In this method, ZnO nanorods are grown on kanthal wires using the direct heating (DH) technique. The study investigated the application of ZnO nanorods in photodegradatio...

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Main Authors: Ahmadipour M., Rezaei Ardani M., chrouda A., Pang A.L., Mohd Razip Wee M.F., Satgunam M.
Other Authors: 55533484700
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Published: Elsevier Ltd 2025
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spelling my.uniten.dspace-364372025-03-03T15:42:25Z Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod Ahmadipour M. Rezaei Ardani M. chrouda A. Pang A.L. Mohd Razip Wee M.F. Satgunam M. 55533484700 57221374739 55769666100 55937339700 58956706300 48561725600 II-VI semiconductors Nanorods Photocatalytic activity Water treatment Analysis techniques Antibiotic sulfamethoxazole Comprehensive analysis Conductive substrates Direct heating Kanthal Photo degradation Primary objective Sulfamethoxazole ZnO nanorod Zinc oxide The primary objective of this research is to synthesize ZnO vertical nanorods on a conductive substrate through a novel approach. In this method, ZnO nanorods are grown on kanthal wires using the direct heating (DH) technique. The study investigated the application of ZnO nanorods in photodegradation, specifically in removing Sulfamethoxazole (SMX). Through comprehensive analysis techniques, including XRD, FESEM, and TEM, the successful growth of ZnO nanorods on kanthal wires is confirmed. Their photocatalytic activity in SMX degradation is evaluated at varying concentrations (3 ppm, 5 ppm, 10 ppm) under UV light. Notably, the ZnO sample produced under 80 W power and 120 min emerges as the most promising, exhibiting a high surface area of 36 m2g-1, larger length of 755 nm, and lower diameter of 12 nm, as well as superior SMX photodegradation percentages of 87.64 % (3 ppm), 77.86 % (5 ppm), and 51.84 % (10 ppm) after 60 min. These findings highlight the potential of synthesizing ZnO nanorods via DH technique as an efficient and sustainable solution for removing pharmaceutical contamination in water sources. ? 2024 Elsevier Ltd and Techna Group S.r.l. Final 2025-03-03T07:42:25Z 2025-03-03T07:42:25Z 2024 Article 10.1016/j.ceramint.2024.04.405 2-s2.0-85192059680 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85192059680&doi=10.1016%2fj.ceramint.2024.04.405&partnerID=40&md5=0ca3b43e5ec9cf6a6104f0f702ee3794 https://irepository.uniten.edu.my/handle/123456789/36437 50 15 27645 27653 Elsevier Ltd Scopus
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
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topic II-VI semiconductors
Nanorods
Photocatalytic activity
Water treatment
Analysis techniques
Antibiotic sulfamethoxazole
Comprehensive analysis
Conductive substrates
Direct heating
Kanthal
Photo degradation
Primary objective
Sulfamethoxazole
ZnO nanorod
Zinc oxide
spellingShingle II-VI semiconductors
Nanorods
Photocatalytic activity
Water treatment
Analysis techniques
Antibiotic sulfamethoxazole
Comprehensive analysis
Conductive substrates
Direct heating
Kanthal
Photo degradation
Primary objective
Sulfamethoxazole
ZnO nanorod
Zinc oxide
Ahmadipour M.
Rezaei Ardani M.
chrouda A.
Pang A.L.
Mohd Razip Wee M.F.
Satgunam M.
Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
description The primary objective of this research is to synthesize ZnO vertical nanorods on a conductive substrate through a novel approach. In this method, ZnO nanorods are grown on kanthal wires using the direct heating (DH) technique. The study investigated the application of ZnO nanorods in photodegradation, specifically in removing Sulfamethoxazole (SMX). Through comprehensive analysis techniques, including XRD, FESEM, and TEM, the successful growth of ZnO nanorods on kanthal wires is confirmed. Their photocatalytic activity in SMX degradation is evaluated at varying concentrations (3 ppm, 5 ppm, 10 ppm) under UV light. Notably, the ZnO sample produced under 80 W power and 120 min emerges as the most promising, exhibiting a high surface area of 36 m2g-1, larger length of 755 nm, and lower diameter of 12 nm, as well as superior SMX photodegradation percentages of 87.64 % (3 ppm), 77.86 % (5 ppm), and 51.84 % (10 ppm) after 60 min. These findings highlight the potential of synthesizing ZnO nanorods via DH technique as an efficient and sustainable solution for removing pharmaceutical contamination in water sources. ? 2024 Elsevier Ltd and Techna Group S.r.l.
author2 55533484700
author_facet 55533484700
Ahmadipour M.
Rezaei Ardani M.
chrouda A.
Pang A.L.
Mohd Razip Wee M.F.
Satgunam M.
format Article
author Ahmadipour M.
Rezaei Ardani M.
chrouda A.
Pang A.L.
Mohd Razip Wee M.F.
Satgunam M.
author_sort Ahmadipour M.
title Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
title_short Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
title_full Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
title_fullStr Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
title_full_unstemmed Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod
title_sort removal of antibiotic sulfamethoxazole in water using rapid growing zno nanorod
publisher Elsevier Ltd
publishDate 2025
_version_ 1825816182009102336
score 13.244413