SOI Single-Electron Transistors (SET) design and process development
Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar.
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Kolej Universiti Kejuruteraan Utara Malaysia
2009
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my.unimap-71042009-08-28T01:59:23Z SOI Single-Electron Transistors (SET) design and process development Amiza, Rasmi Mohammad Nuzaihan, Md Nor Uda, Hashim Single-electron transistor (SET) Single-electron transistor (SET) -- Design and construction Transistors Litography Electron Beam Lithography (EBL) Lithography, Electron beam Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar. Single-electron transistor (SET) is attractive devices to use for large-scale integration. SET can be made very small, dissipate little power, and can measure quantities of charge much faster than MOSFETs. This makes SET would replace field-effect transistor (FET). In this paper, Electron Beam (EBeam) GDS II Editor Software is utilized to design a mask for SOI SET fabrication. This system show promising result producing structure at nanometer scale node. Four masks step are involved namely source/drain & gate mask, Poly-Si gate electrode mask, contact mask, and metallization mask. SOI SET device design with a gate length and gate width of approximately 0.1μm and 0.02μm respectively is generated for fabrication process. In addition, the processes involve in SOI SET fabrication are also discussed. 2009-08-28T01:28:47Z 2009-08-28T01:28:47Z 2005-05-18 Working Paper p.85-90 http://hdl.handle.net/123456789/7104 en Proceedings of the 1st National Conference on Electronic Design Kolej Universiti Kejuruteraan Utara Malaysia |
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Single-electron transistor (SET) Single-electron transistor (SET) -- Design and construction Transistors Litography Electron Beam Lithography (EBL) Lithography, Electron beam |
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Single-electron transistor (SET) Single-electron transistor (SET) -- Design and construction Transistors Litography Electron Beam Lithography (EBL) Lithography, Electron beam Amiza, Rasmi Mohammad Nuzaihan, Md Nor Uda, Hashim SOI Single-Electron Transistors (SET) design and process development |
description |
Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar. |
format |
Working Paper |
author |
Amiza, Rasmi Mohammad Nuzaihan, Md Nor Uda, Hashim |
author_facet |
Amiza, Rasmi Mohammad Nuzaihan, Md Nor Uda, Hashim |
author_sort |
Amiza, Rasmi |
title |
SOI Single-Electron Transistors (SET) design and process development |
title_short |
SOI Single-Electron Transistors (SET) design and process development |
title_full |
SOI Single-Electron Transistors (SET) design and process development |
title_fullStr |
SOI Single-Electron Transistors (SET) design and process development |
title_full_unstemmed |
SOI Single-Electron Transistors (SET) design and process development |
title_sort |
soi single-electron transistors (set) design and process development |
publisher |
Kolej Universiti Kejuruteraan Utara Malaysia |
publishDate |
2009 |
url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/7104 |
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1643788685796179968 |
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13.222552 |