Description: Effect of substrate bias in copper sputtering plasma measured by Langmuir Probe

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Bibliographic Details
Main Authors:	Jia Wei, Low, Nafarizal, Nayan, Mohd Zainizan, Sahdan, Mahamad, Abd Kadir, Mohd Khairul, Ahmad, Ali Yeon, Md Shakaff, Ammar, Zakaria, Fathinul Syahir, Ahmad Saad, Ahmad Faizal, Mohd Zain
Other Authors:	jwlow88@hotmail.com
Format:	Article
Language:	English
Published:	Trans Tech Publications Inc. 2015
Subjects:	Copper oxide Langmuir probe Reactive magnetron sputtering
Online Access:	http://dspace.unimap.edu.my:80/xmlui/handle/123456789/39125
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